The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Mar. 17, 2014
Shibaura Mechatronics Corporation, Yokohama-shi, JP;
Koichi Hamada, Yokohama, JP;
Nobuo Kobayashi, Yokohama, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Abstract
According to one embodiment, a substrate processing apparatus () includes: a support () configured to support a substrate (W); a rotation mechanism () configured to rotate the support () about an axis that crosses the substrate (W) supported by the support () as a rotation axis; a nozzle () configured to supply a treatment liquid to a surface of the substrate (W) on the support () being rotated by the rotation mechanism (); a heater () configured to heat the substrate (W) supported by the support () at a distance from the substrate (W); and a movement mechanism () configured to move the heater () in directions toward and away from the substrate (W) supported by the support ().