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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10026631 B1

PDFFull Text
Date of Patent:
Jul. 17, 2018

Filed:

Feb. 09, 2017

Plasma processing apparatus and heater temperature control method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Kaoru Oohashi, Miyagi, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

IPUSA, PLLC

Primary Examiner:

Sophia Nguyen

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01); H02N 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); H01J 37/32082 (2013.01); H01J 37/32642 (2013.01); H01J 37/32724 (2013.01); H01J 37/32935 (2013.01); H01L 21/3065 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01); H01L 21/32137 (2013.01); H01L 21/67069 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/6831 (2013.01); H01L 21/6833 (2013.01); H01L 22/26 (2013.01); H02N 13/00 (2013.01); H01J 37/32091 (2013.01); H01J 37/32183 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/334 (2013.01);
Abstract

A plasma processing apparatus is provided that converts a gas into plasma using a high frequency power and performs a plasma process on a workpiece using an action of the plasma. The plasma processing apparatus includes a processing chamber that can be depressurized, a mounting table that is arranged within the processing chamber and holds the workpiece, an electrostatic chuck that is arranged on the mounting table and electrostatically attracts the workpiece by applying a voltage to a chuck electrode, a heater arranged within or near the electrostatic chuck, and a temperature control unit. The heater is divided into a circular center zone, at least two middle zones arranged concentrically at an outer periphery side of the center zone, and an edge zone arranged concentrically at an outermost periphery. The temperature control unit adjusts a control temperature of the heater with respect to each of the zones.

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