The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Oct. 03, 2016
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Gerald Rothenhoefer, Oberkochen, DE;

Christian Kempter, Wittislingen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 7/182 (2006.01); G02B 7/18 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70766 (2013.01); G02B 7/181 (2013.01); G02B 7/1828 (2013.01); G03F 7/70758 (2013.01); G03F 7/70825 (2013.01); G03F 7/70891 (2013.01);
Abstract

The disclosure relates to a method and an arrangement for actuating an element in a system for microlithography. According to an aspect in at least one degree of freedom an actuator force is exerted on the element via at least two actuator components. The actuator components are driven independently of one another for generating the actuator force. Driving is effected so that a thermal power introduced into the system on account of the generation of the actuator force by the actuator components deviates from a predefined constant value by not more than 20%.


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