The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Nov. 08, 2016
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Pascal Marsollek, Aalen, DE;
Johannes Lippert, Buch am Wald, DE;
Jasper Wesselingh, Moettingen, DE;
Sascha Bleidistel, Aalen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/02 (2006.01); G03B 27/52 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706 (2013.01); G02B 27/0025 (2013.01); G03F 7/7015 (2013.01); G03F 7/7095 (2013.01); G03F 7/70191 (2013.01); G03F 7/70258 (2013.01); G03F 7/70266 (2013.01); G03F 7/70308 (2013.01); G03F 7/70825 (2013.01);
Abstract
A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.