The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Feb. 03, 2015
Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Shuhei Shigaki, Toyama, JP;

Yasushi Sakaida, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); C08L 83/04 (2006.01); C09D 183/04 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
G03F 7/405 (2013.01); C08L 83/04 (2013.01); C09D 183/04 (2013.01); G03F 7/0752 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/2053 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/3086 (2013.01);
Abstract

There is provided a polymer-containing coating liquid which is applied to a resist pattern and which is used in place of a conventional rinsing liquid. A coating liquid that is applied to a resist pattern comprising a polymer having a structural unit of Formula (1): (wherein Ris a Corganic group, and X is an organic group of Formula (2): (wherein Rand Rare each independently a linear or branched alkylene group having a carbon atom number of 1 to 3, Ris bonded to an oxygen atom in Formula (1), Ris a Calkoxy group, an allyloxy group, or a hydroxy group, and p is 0, 1, or 2)), and a solvent containing water and/or alcohols.


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