The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Mar. 09, 2017
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Shih-Ping Hong, Hsinchu County, TW;
Yu-Cheng Liu, Zhubei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/3213 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); B08B 7/00 (2006.01); B08B 9/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02071 (2013.01); B08B 7/0035 (2013.01); B08B 9/0865 (2013.01); H01J 37/3244 (2013.01); H01J 37/32834 (2013.01); H01J 37/32862 (2013.01); H01J 37/32871 (2013.01); H01L 21/0206 (2013.01); H01L 21/02334 (2013.01); H01L 21/31116 (2013.01); H01L 21/32136 (2013.01); H01L 21/67069 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01);
Abstract
A method for cleaning a substrate is provided. The method includes providing a substrate. Metal compound residues are formed over the substrate. The method includes exposing the substrate to an organic plasma to volatilize the metal compound residues. The organic plasma is generated from a gas. The gas includes an organic gas, and the organic gas is made of a hydrocarbon compound or an alcohol compound.