The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
May. 07, 2015
Asml Netherlands B.v., Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Christianus Wilhelmus Johannes Berendsen, Roermond, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Jim Vincent Overkamp, Eindhoven, NL;
Siegfried Alexander Tromp, Papendrecht, NL;
Van Vuong Vy, Eindhoven, NL;
Daniel Elza Roeland Audenaerdt, Veldhoven, NL;
ASML NETHERLANDS, B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising: a channel () for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (); a second material () between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material () between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.