The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2018

Filed:

Feb. 02, 2017
Applicant:

Jeol Ltd., Tokyo, JP;

Inventor:

Yuji Kohno, Tokyo, JP;

Assignee:

JEOL Ltd., , JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/22 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/24455 (2013.01); H01J 2237/2802 (2013.01);
Abstract

There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope () comprises: an electron beam source () for producing an electron beam (EB); an illumination lens system () for focusing the electron beam (EB) onto a sample (S); a scanner () for scanning the focused electron beam (EB) over the sample (S); an aperture stop () having a plurality of detection angle-limiting holes () for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector () for detecting the rays of the electron beam (EB) passed through the aperture stop ().


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