The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Mar. 16, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Assignee:
SHIN-ESTU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); G03F 7/16 (2006.01); C08F 220/36 (2006.01); G03F 7/004 (2006.01); G03F 7/38 (2006.01); G03F 7/32 (2006.01); C08F 220/52 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 220/28 (2013.01); C08F 220/30 (2013.01); C08F 220/36 (2013.01); C08F 220/52 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); C08F 2220/282 (2013.01); C08F 2220/283 (2013.01); C08F 2220/301 (2013.01); C08F 2220/365 (2013.01);
Abstract
A resist composition is provided comprising a polymer comprising recurring units (a) having a succinimide structure and recurring units (b) containing a group capable of polarity switch with the aid of acid. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.