The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Feb. 16, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07C 381/12 (2006.01); H01L 21/027 (2006.01); G03F 7/11 (2006.01); C08F 220/30 (2006.01); C08F 220/34 (2006.01); C08F 220/38 (2006.01); G03F 7/16 (2006.01); G03F 7/38 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 381/12 (2013.01); C08F 220/30 (2013.01); C08F 220/34 (2013.01); C08F 220/38 (2013.01); G03F 7/004 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/32 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); C08F 2220/281 (2013.01); C08F 2220/282 (2013.01); C08F 2220/301 (2013.01); C08F 2220/302 (2013.01); C08F 2220/303 (2013.01); C08F 2220/382 (2013.01); C08F 2220/385 (2013.01); C08F 2800/10 (2013.01);
Abstract
A non-chemically-amplified positive resist composition comprising a polymer comprising both recurring units derived from a sulfonium salt capable of generating a fluorinated acid and recurring units containing an amino group as a base resin exhibits a high resolution and a low edge roughness and forms a pattern of good profile after exposure and organic solvent development.