The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2018

Filed:

Mar. 06, 2017
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Shih-Yin Hsiao, Chiayi County, TW;

Hsuan-Kai Chen, Taichung, TW;

Tun-Jen Cheng, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/40 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/404 (2013.01); H01L 29/1095 (2013.01); H01L 29/408 (2013.01); H01L 29/7816 (2013.01);
Abstract

A high-voltage metal-oxide-semiconductor transistor device includes a semiconductor substrate, a gate structure, a first drift region, a first isolation structure, a drain region, and a first sub-gate structure. The gate structure and the first sub-gate structure are disposed on the semiconductor substrate and separated from each other. The first drift region is disposed in the semiconductor substrate and disposed at one side of the gate structure. The first isolation structure and the drain region are disposed in the first drift region and separated from each other. A part of the first drift region is disposed between the drain region and the first isolation structure. The first sub-gate structure is at least partially disposed on the first drift region disposed between the drain region and the first isolation structure, and the first sub-gate structure is electrically connected to the drain region.


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