The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Mar. 17, 2017
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Jens Prochnau, Oberkochen, DE;
Dirk Schaffer, Jena, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G02B 7/182 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); G03F 7/7015 (2013.01); G03F 7/70825 (2013.01);
Abstract
An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. The mounting element alone holds the mirror element at least approximately in an equilibrium position, such that the at least one actuator is at least approximately free of forces in the equilibrium position.