The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2018
Filed:
Jun. 26, 2015
Asml Netherlands B.v., Veldhoven, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Willem Jan Bouman, Moergestel, NL;
Han Henricus Aldegonda Lempens, Weert, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Cornelius Maria Rops, Waalre, NL;
Bart Smeets, Bilzen, NL;
Koen Steffens, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.