Advanced Micro-fabrication Equipment Inc. China

Zhou Xiaofeng

Tuqiang Ni

Sha Rin

Steven Lee

Mei Rui

Disclosed is a plasma reactor, comprising: a reaction chamber; a base disposed at the bottom of the reaction chamber, configured for supporting a substrate; an RF power supply which outputs an RF power into the reaction chamber, wherein the base includes an electrostatic chuck, the electrostatic chunk including a set of heaters, the set of heaters including a plurality of heating modules, wherein each heating module includes one heater and one electronic switch which are connected in series, the heater in each heating module being connected to one of the heating power source and the ground, and the electronic switch being connected to the other one of the heating power source and the ground; a heating controller including a receive end configured for receiving a temperature control signal, and further a drive signal output end connected to the electronic switch, configured for outputting a drive signal of the electronic switch, wherein the heating controller further comprises at least one optoelectrical drive circuit to cause the receive end of the heating controller to be electrically isolated from the drive signal output end.

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Shanghai, China

Zhou Xiaofeng