Taiwan Semiconductor Manufacturing Comp. Ltd.

Zhe-Wei Jiang

Hui-Zhong Zhuang

Chi-Lin Liu

Cheok-Kei Lei

Chi-Yu Lu

Jerry Chang Jui Kao

Jerry Chang-Jui Kao

Sung-Yen Yeh

Yi-Hsin Ko

Yu-Chi Li

Chia-Wei Tseng

Li-Chun Tien

Jung-Chan Yang

Li Chung Hsu

Chien-Hsing Li

Lee-Chung Lu

Chung-Hsing Wang

Ting-Wei Chiang

Yuan-Te Hou

King-Ho Tam

Yeh-Chi Chang

Yi-Kan Cheng

Kuo-Nan Yang

Wen-Hao Chen

Wen-Ju Preet Yang

Huang-Yu Chen

Gwan Sin Chang

Shyue-Shyh Lin

Chung-Min Fu

Yen-Pin Chen

Jung-chan Yang

A method performed by at least one processor includes the following steps: generating a layout of an integrated circuit (IC), the layout comprising a cell and a layout context in a vicinity of the cell; receiving from a library a set of context groups and a set of timing tables, wherein each of the context groups is associated with one of the set of timing tables; determining a representative context group for the cell through comparing the layout context of the cell with the set of context groups; and performing a timing analysis on the layout according to a representative timing table associated with the representative context group for the cell.

Layout context-based cell timing characterization

The present disclosure describes a method for optimizing metal cuts in standard cells. The method includes placing a standard cell in a layout area and inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell. The method further includes disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut.

Metal cut optimization for standard cells

A method of modifying an integrated circuit layout includes determining whether a first conductive line and a second conductive line are subject to a parasitic capacitance above a parasitic capacitance threshold. The method further includes adjusting the integrated circuit layout by moving the first conductive line in the integrated circuit layout in response to determining to move the first conductive line. The method further includes inserting an isolation structure between the first and second conductive lines in the integrated circuit layout in response to determining not to move the first conductive line.

Capacitive isolation structure insert for reversed signals

A layout method includes disposing a first conductive path and a second conductive path across a boundary between a first layout device and a second layout device abutting the first layout device. The layout method also includes disposing a first cut layer on the first conductive path nearby the boundary, and disposing a second cut layer on the second conductive path nearby the boundary. The layout method also includes moving the first cut layer to align with the second cut layer.

Layout for integrated circuit and the integrated circuit

A method performed by at least one processor includes the following steps. A layout of an integrated circuit (IC) is accessed, wherein the layout has at least one cell. A context group for the cell is determined based on a layout context of the cell, wherein the context group is associated with a timing table. A timing analysis is performed on the layout to determine whether the layout complies with a timing constraint rule according to the timing table. A system including one or more processors including instructions for implementing the method and a non-transitory computer readable storage medium including instructions for implementing the method are also provided.

A method of making an integrated circuit includes operations to identify reverse signal nets of the circuit layout, determine the parasitic capacitance in conductive lines, and determine how to adjust an integrated circuit layout to reduce the parasitic capacitance of the conductive lines to the reverse signal net. The method further includes an operation to determine whether to move one of the conductive lines in the integrated circuit layout, an operation to determine whether to insert an isolation structure between the conductive lines of the reverse signal net having parasitic capacitance, and operations to adjust the layout by moving a conductive line.

A layout method comprises selecting a first and a second layout devices in a layout of an integrated circuit. The second layout device abuts the first layout device at a boundary therebetween. The layout method also comprises disposing a first and a second conductive paths across the boundary, and respectively disposing a first and a second cut layers on the first and second conductive paths nearby the boundary. The layout method also comprises disconnecting the first layout device from the second layout device by cutting the first conductive path into two conductive portions according to a first position of the first cut layer and cutting the second conductive path into two conductive portions a second position of the second cut layer. The layout method also comprises moving the first cut layer to align with the second cut layer.

The present disclosure describes a method for optimizing metal cuts in standard cells. The method includes placing a standard cell in an layout area and inserting a metal cut along a metal interconnect of the standard cell at a location away from a boundary of the standard cell. The method further includes disconnecting, at the location, a metal portion of the metal interconnect from a remaining portion of the metal interconnect based on the metal cut.

A method of making an integrated circuit includes operations to identify reverse signal nets of the circuit layout, determine when the conductive lines to the reverse signal net have parasitic capacitance, and determine how to adjust an integrated circuit layout to reduce the parasitic capacitance of the conductive lines to the reverse signal net. The method further includes an operation to determine whether to move one of the conductive lines in the integrated circuit layout, and an operation to determine whether to insert an isolation structure between the conductive lines of the reverse signal net having parasitic capacitance.

A layout of an integrated circuit includes: a first layout device; a second layout device abutting the first layout device at a boundary between the first layout device and the second layout device, wherein the second layout device is a redundant circuit in the integrated circuit; a conductive path disposed across the boundary of the first layout device and the second layout device; and a cut layer disposed on the conductive path and nearby the boundary for disconnecting the first layout device from the second layout device by cutting the conductive path into a first conductive portion and a second conductive portion according to a position of the cut layer; wherein the first layout device is a first layout pattern and the second layout device is a second layout pattern different from the first layout pattern.

A layout method includes: selecting, by a processor or manual, a first layout device in a layout of an integrated circuit; selecting a second device abutting the first layout device at a boundary between the first layout device and the second layout device, wherein a conductive path is disposed across the boundary of the first layout device and the second layout device; and disposing a cut layer on the conductive path and nearby the boundary. The first layout device is a first layout pattern and the second layout device is a second layout pattern different from the first layout pattern.

Layout method for integrated circuit and layout of the integrated circuit

A method of forming a layout design is disclosed. The method includes placing a first set of layout patterns in a first layout layer and placing a second set of layout patterns in a second layout layer. The first set of layout patterns is aligned with one or more grid lines of a first set of grid lines. The first set of grid lines extends along a first direction, where two grid lines of the first set of grid lines overlap two cell boundaries of a standard cell layout. The second set of layout patterns is aligned with one or more grid lines of a second set of grid lines. The second set of grid lines extends along the first direction and has at least two different line pitches, where two grid lines of the second set of grid lines overlap two cell boundaries of the standard cell layout.

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Hsinchu, Taiwan

Zhe-Wei Jiang