United Microelectronics Corp.

Zhaobing Li

Chi Ren

Liang Yi

Cheng-Yuan Hsu

Wei Cheng

Ching-Long Tsai

Lingzi Li

Hui Lu

Zhang Hu Sun

A structure of nonvolatile memory device includes a substrate, having a logic device region and a memory cell region. A first gate structure for a low-voltage transistor is disposed over the substrate in the logic device region, wherein the first gate structure comprises a single-layer polysilicon. A second gate structure for a memory cell is disposed over the substrate in the memory cell region. The second gate structure includes a gate insulating layer on the substrate. A floating gate layer is disposed on the gate insulating layer, wherein the floating gate layer comprises a first polysilicon layer and a second polysilicon layer as a stacked structure. A memory dielectric layer is disposed on the floating gate layer. A control gate layer is disposed on the memory dielectric layer, wherein the control gate layer and the single-layer polysilicon are originated from a preliminary polysilicon layer in same.

Structure of a nonvolatile memory device with a low-voltage transistor fabricated on a substrate

Method for fabricating low and high/medium voltage transistors on substrate

A high-voltage semiconductor device includes a semiconductor substrate, a gate structure, a drain, an insulation structure, and a plurality of conductive structures. The insulation structure is disposed in the semiconductor substrate and disposed between the gate structure and the drain. The insulation structure includes a plurality of insulation units disposed separately from one another. Each of the conductive structures is embedded in one of the insulation units.

High-voltage semiconductor device with finger-shaped insulation structure

A floating gate forming process includes the following steps. A substrate containing active areas isolated from each other by isolation structures protruding from the substrate is provided. A first conductive material is formed to conformally cover the active areas and the isolation structure. An etch back process is performed on the first conductive material to respectively form floating gates separated from each other in the active areas.

Floating gate forming process

Growing community of inventors

Singapore, Singapore

Zhaobing Li