Chugai Seiyaku Kabushiki Kaisha

Ulvac, Inc.

Showa Highpolymer Co., Ltd.

Toho Tenax Co., Ltd.

F.t.l. Co., Ltd.

Yutaka Miura

Yoshinori Suzuki

Mikio Takagi

Sakae Takaku

Seiichi Takahashi

Mitsutaka Yoshida

Hiroaki Inoue

Yukifumi Noda

Yasuo Fujimura

Masayuki Satou

Mitsuhiro Yada

Katsura Horikoshi

Native oxide film on a semiconductor silicon wafer(s) is dry etched at a temperature of 50&#xb0; C. or less. Hydrogen treatment is then carried out a temperature of 100&#xb0; C. or more to bond the dangling bonds with hydrogen. A jigthat has been used is again used for loading new semiconductor silicon wafer(s). The wafer(s) on the jigis subjected to removal of a native oxide film and then hydrogen bonding. The resultant heat remains in jig and makes it difficult to maintain the wafers to temperature appropriate to removal of a native oxide film. After treatment of hydrogen bonding, inert gas having temperature of from 0 to &#x2212;30&#xb0; C. is injected into reaction vesseland/or treatment preparing vessel, in which a native oxide film has been removed.

Method for surface treating semiconductor

Carbon fiber-reinforced resin composite materials

4-aminopyridine derivatives represented by the general formula: ##STR1## [wherein R.sub.1 is a hydrogen atom, a hydroxyl group, a linear or branched lower alkyl group or a cycloalkyl group which may be substituted by a hydroxyl group, a lower alkoxy group, a lower alkyl or a cycloalkyl group which contains a carbonyl group, a morpholino group or a group --NH--B (where B is a lower alkyl group, a cycloalkyl group or a phenyl group); R.sub.2 and R.sub.3 which may be the same or different each represents a hydrogen atom, a lower alkyl group or a loweralkylcarbonyl group, or when taken together, form an azacycloalkyl group, a morpholino group or an N-methylpiperazinyl group together with the nitrogen atom; R.sub.4 and R.sub.5 each represents a hydrogen atom, or when taken together with the ring A, form a quinoline ring or a 5,6,7,8-tetrahydroquinoline ring, provided that when each of R.sub.1, R.sub.4 and R.sub.5 is a hydrogen atom, R.sub.2 and R.sub.3 are neither a hydrogen atom nor a methyl group at the same time, and when R.sub.1 is a hydrogen atom and R.sub.4 and R.sub.5 taken together with the ring A form a quinoline ring, R.sub.2 and R.sub.3 are neither a hydrogen atom nor an ethyl group at the same time], and an acid addition salts of said 4-aminopyridine derivatives. These compounds are useful as active ingredients in pharmaceutical compositions for improving psychoneural function, especially in the treatment of Alzheimer type dementia and promotion of mnemonic and learning performance.

3,4-diaminoquinoline and 3,4-diamino-5,6,7,8-tetrahydroquinoline

Growing community of inventors

Shizuoka, Japan

Yutaka Miura