Industrial Technology Research Institute

Taiwan Semiconductor Manufacturing Comp. Ltd.

Tsinghua University

Yung-Fa Chou

Ding-Ming Kwai

Ting-Sheng Chen

Yue-Der Chih

Cheng-Wen Wu

Jui-Hung Chien

Chiao-Ling Lung

Po-Yuan Chen

A test method for an interposer is provided. The interposer includes a plurality of conductive lines therein and a plurality of connecting contacts thereon, wherein the connecting contacts are electrically connected to the conductive lines. The test method for an interposer provides a passive transponder device. The passive transponder device includes a first circuit including an open/short test circuit and at least a pair of connecting contacts. The test method for an interposer includes contacting the connecting contacts of the first circuit in the passive transponder device with the selected contacts on the interposer to form a checking area and conducting an open-circuit or short-circuit test for the interposer through the checking area.

Test method for interposer

A memory device including at least one bit-line decoding circuit, at least one word-line decoding circuit, a plurality of memory blocks, and a plurality of switches is provided. The sizes of the plurality of memory blocks include at least one first size and a second size, and the first size is greater than the second size. The plurality of memory blocks with the first size are grouped as at least one first group, and the plurality of memory blocks with the second size are grouped as at least one second group. Compared to the first group, the second group is closer to the bit-line decoding circuit and/or the word-line decoding circuit. The switches are controlled by at least one control signal, so as to enable or disable the first group and/or the second group.

Memory device

A semiconductor device stacked structure is disclosed, which includes multiple semiconductor devices and at least one reinforcing structure. The semiconductor devices are stacked on one another. At least one semiconductor device has at least one through silicon via. Each reinforcing structure surrounds a corresponding one of the at least one through silicon via and is electrically insulated from the semiconductor devices. The at least one reinforcing structure includes multiple reinforcing elements and at least one connecting element. Each reinforcing element is disposed between the semiconductor devices. Vertical projections of the reinforcing elements on a plane define a close region, and a projection of the at least one through silicon via on the plane is located within the close region. The connecting element is located in an overlapping region of the vertical projections of the reinforcing elements on the plane, for connecting the reinforcing elements to form the reinforcing structure.

Semiconductor device stacked structure

A method for testing a TSV comprises charging a through-silicon-via under test to a first predetermined voltage level charging a capacitance device to a second predetermined voltage level; performing charge-sharing between the through-silicon-via and the capacitance device; and determining that the through-silicon-via under test is not faulty if the voltage level of the through-silicon-via after the charge-sharing step is within a predetermined range.

Method for testing through-silicon-via

An operating method of a hardwired switch is provided. First, a first die is provided. The first die is configured as the first die in the hardwired switch. Next, a function of the first die is inspected to obtain an inspected result. Upon the inspected result, whether a second TSV is selectively disposed between the first landing pad and the fifth landing pad, between the second landing pad and the sixth landing pad, between the third landing pad and the seventh landing pad, or between the fourth landing pad and the eighth landing pad or not is determined. The first die is stacked above a second die, so that the second surface is located between the first die and the second die.

Operating method of hardwired switch

A three-dimensional integrated circuit (3-D IC) includes a controller chip and at least one memory chip, in which, besides an original storage capacity, the memory chip further includes multiple spare memory cells and an address translation circuit with an external activation/enablement function. After the memory chip and the controller chip are stacked, the controller chip may still activate/enable a spare in the memory chip to repair a damaged or deteriorated memory cell in the memory chip through at least one vertical interconnect (for example, through-silicon via (TSV)), regardless of whether the damaged or deteriorated memory cell has been repaired or not before the controller chip and the memory chip are stacked.

Technology of memory repair after stacking of three-dimensional integrated circuit

A stacked structure and a stacked method for a three-dimensional integrated circuit are provided. The provided stacked method includes separating a logic chip into a function chip and an I/O chip; stacking the function chip above the I/O chip; and stacking at least one memory chip between the function chip and the I/O chip.

Stacked structure and stacked method for three-dimensional chip

A method for repairing an integrated circuit comprises: fabricating a first circuit, the first circuit including a plurality of regular units and a plurality of redundant units, each of the regular units being identified by an address; performing a first test on the first circuit to determine if a defective regular unit is present; activating, if the defective regular unit is present, at least a first redundant unit to replace the defective regular unit, the first redundant unit being identified by an address of the defective regular unit; performing, if the at least first redundant unit is present, a second test on the first circuit to determine if the first redundant unit is defective; and activating at least a second redundant unit to replace the defective first redundant unit, the second redundant unit being identified by the address of the defective regular unit.

Apparatus and method for repairing an integrated circuit

A wafer and a method for improving the yield rate of the wafer are provided. The wafer includes a first and a second circuit units, a first and a second through silicon vias (TSVs), and a first spare TSV. The first and the second circuit units are disposed inside the wafer. The first TSV vertically runs through the wafer and is coupled to the first circuit unit through the front metal of the wafer. The second TSV vertically passes through the wafer and is coupled to the second circuit unit through the front metal of the wafer. When the first or the second TSV has failed, the first spare TSV vertically passes through the wafer to replace the failed first or second TSV.

Wafer and method for improving yield rate of wafer

A stacked structure of chips including a first chip and a second chip is provided. The first chip includes a first and a second circuit blocks, a signal path, a first and a second hardwired switches. The second chip stacks with the first chip stack and includes a third circuit block, a third and a fourth hardwired switches. If the first circuit block is defective and the second and the third circuit blocks are functional, the first hardwired switch and the third hardwired switch are set correspondingly such that a power-supply bonding pad is connected to the third power terminal and disconnected to the first power terminal, and the second hardwired switch and the fourth hardwired switch are set correspondingly such that the third signal terminal is electrically connected to the signal path to make the third circuit block replace the first circuit block and provide the first function.

Stacked structure of chips

A hardwired switch of a die stack including eight landing pads is provided. A first, a second, a third, and a fourth landing pads are disposed on a first surface of a die. The second and the fourth landing pads are electrically connected to the first and the third landing pads respectively. A fifth, a sixth, a seventh, and an eighth landing pads are disposed on a second surface of the die. The seventh and the eighth landing pads are electrically connected to the sixth and the fifth landing pads respectively. In a vertical direction of the die, the first, the second, the third, and the fourth landing pads overlap partially or fully with the fifth, the sixth, the seventh, and the eighth landing pads respectively. In addition, an operating method of a hardwired switch is also provided.

Hardwired switch of die stack and operating method of hardwired switch

A method for repairing a chip with a stacked structure of chips is provided. First, a first chip is provided, which includes a first circuit block with a first function, a second circuit block with a second function, and a signal path electrically connected to the first and the second circuit blocks. A second chip is provided, which includes a third circuit block with the first function. The functions of the first and the second chips are verified. The first circuit block is disabled if the first circuit block is defective. The third circuit block is electrically connected to the signal path to replace the first circuit block and provide the first function if the second circuit block is functional and the third circuit block is functional.

Method of chip repair by stacking a plurality of bad dies

A layout structure and layout method are provided. The layout structure includes a first conductive via, a second conductive via, a die and eight pads. The first conductive via and the second conductive via pass through the die. The first conductive via has a first pad and a second pad, and the second conductive via has a third pad and a fourth pad. A fifth pad is conducted to the third pad. A sixth pad is conducted to the second pad. A seventh pad is conducted to the first pad. An eighth pad is conducted to the fourth pad. In a vertical direction of the die, the first pad and the second pad are overlapped, the third pad and the fourth pad are overlapped, the fifth pad and the sixth pad are overlapped, and the eighth pad and the seventh pad are overlapped, partially or totally.

Die stacking structure and fabricating method thereof

An isolation circuit is provided. The isolation circuit is coupled to an output and an input node and includes a first set, a second switch set, and a body bias voltage generator. The first switch set couples a switch control node to a second voltage when a first voltage is at a first voltage level, and couples the switch control node to the input node when the first voltage is at a second voltage level. The second switch set couples the output node to the input node when the first voltage is at the first voltage level, and isolates the output node from the input node when the first voltage is at the second voltage level. The body bias voltage generator selectively provides a higher one of the first voltage and a voltage on the input node to a body of the second switch set.

Isolation circuit

A comparable circuit employed for parallel testing DRAM devices is disclosed, wherein the disclosed comparable circuit basically encompasses a three-stage circuit composed of two XNOR gates, a XOR gate, and a tri-state output buffer. The first stage consisting of the XOR gate and a first XNOR gate parallel receive the stored test pattern from the detected memory cell to respectively generate a pair of first comparison results. A second exclusive XNOR gate included in the second stage receives the first comparison results, and connects with the third stage through an output terminal of the second XNOR gate. The third stage composed of the output buffer couples with the output terminal of the second XNOR gate to generate a second comparison result further routed to I/O bus. Chess-like test patterns can be employed in the disclosed comparable circuit due to two mutually exclusive logic gates are generated in the first stage. On the other hand, logic 1 freezes on I/O bus if two input terminals of the second XNOR gate are shorted, which indicates the comparable circuit is defective.

Growing community of inventors

Kaohsiung, Taiwan

Yung-Fa Chou