Hitachi-high-technologies Corporation

The University of Tokyo

Hitachi High-tech Corporation

Zeon Corporation

Tohoku University

Yuko Otani

Toshifumi Honda

Shunichi Matsumoto

Yuta Urano

Masahiro Watanabe

Takehiro Tachizaki

Yuji Takagi

Kazuo Aoki

Yohei Minekawa

Takehiro Hirai

Sho Nakamura

Taketo Ueno

Junken Aoki

Tomohiko Ohwada

Nobuhiko Kanzaki

Sejin Jung

Shunji Maeda

Satoru Takahashi

Hideki Nakayama

Taku Matsumura

Kiyoshi Takamasu

Yuya Isomae

Takashi Nobuhara

Miyuki Fukuda

Asuka Inoue

Misa Sayama

Masaya Ikubo

Kumiko Makide

Kaori Yaeshima

A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.

Defect detection device, defect detection method, and defect observation apparatus including defect detection device

The invention is to provide a defect detection device capable of using a compact optical system to detect a plurality of types of defects with high sensitivity and high speed. The defect detection device includes an irradiation system that irradiates light onto an object to be inspected; an optical system that forms scattered light produced by a light irradiation into an image; a microlens array disposed at an image plane of the optical system; an imaging element that is disposed at a position offset from the imaging plane of the optical system and that images light that passes through the microlens array; a mask image storage unit that stores a plurality of mask images generated for each type of defect or each defect direction; and a calculation unit that carries out mask processing on an image obtained from the imaging element using the plurality of mask images and carries out defect detection processing.

Defect detection device, defect detection method, and defect observation device

A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.

Defect observation device

Provided is a defect detection device including an illumination unit including a condenser lens and a plurality of light beam synthesis units, and a detection unit detecting scattered light generated on a sample by the illumination unit. The condenser lens condenses a plurality of light beams, emitted onto the sample and having substantially the same wavelength and substantially the same polarization, on the sample. The plurality of light beam synthesis units bring the plurality of light beams close to each other and make the light beams have light paths parallel to the optical axis of the condenser lens.

Defect detection device and defect observation device

A defect observation apparatus includes a storage unit configured to store defect information about defects detected by an external inspection apparatus; a first imaging unit configured to capture an image of a defect using a first imaging condition and a second imaging condition; a control unit configured to correct positional information on the defect using the image captured with the first imaging unit; and a second imaging unit configured to capture an image of the defect based on the corrected positional information.

Defect observation apparatus

To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through the filter, and a detector for dividing the image of the scattered light focused by the imaging lens into the polarization directions converted by a wavelength plate and detecting the resulting images, and the control has a calculation unit for determining the position of a defect candidate detected by another inspection device using the plurality of images separated into polarization directions and detected by the detector.

Defect reviewing method and device

A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.

Defect observation method and device and defect detection device

The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

Defect detection method and defect detection device and defect observation device provided with same

A defect inspection method includes irradiating a sample with laser, condensing and detecting scattered light beams, processing signals that detectors have detected and extracting a defect on a sample surface, and outputting information on the extracted defect. Detection of the scattered light beams is performed by condensing the scattered light beams, adjusting polarization directions of the condensed scattered light beams, mutually separating the light beams depending on the polarization direction, and detecting the light beams by a plurality of detectors. Extraction of the defect is performed by processing output signals from the detectors by multiplying each detection signal by a gain, discriminating between a noise and the defect, and detecting the defect.

Defect inspection device and defect inspection method

An object of the present invention is to provide a lysophosphatidylserine derivative or a salt thereof. The present invention provides a lysophosphatidylserine derivative or a salt thereof, or a pharmaceutical composition or a lysophosphatidylserine receptor function modulator comprising said compound or a salt thereof.

Lysophosphatidylserine derivative

Disclosed are a method and an apparatus for observing defects by using an SEM, wherein, in order to observe defects on a wafer at high speed and high sensitivity, positional information of defects on a sample, which has been optically inspected and detected by other inspecting apparatus, and information of the conditions of the optical inspection having been performed by other inspecting apparatus are obtained, and optically detecting the defects on the sample placed on a table, on the basis of the thus obtained information, and on the basis of the detected positional information of the defect on the sample placed on the table, the positional information of the defect having been inspected and detected by other inspecting apparatus is corrected, then, the defects on the sample placed on the table are observed by the SEM using the thus corrected positional information of the defects.

Method and apparatus for observing defects

A method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.

Method for reviewing a defect and apparatus

Composite particles for electrochemical device electrode which contain an electrode active material, a non-water soluble particle-shaped polymer, and a water-soluble polymer having a sulfonic acid group are provided. According to the present invention, composite particles for electrochemical device electrode are high in fluidity, exhibit high adhesion with a current collector, and can provide an electrochemical device electrode which is high in initial capacity, low in internal resistance, an excellent in high temperature storage characteristics are provided.

Composite particles for electrochemical device electrode, material for electrochemical device electrode, and electrochemical device electrode

The present invention is suppressing the elongating phenomenon in the dark field image of defects in detecting a minute defect by using a dark field microscope. Provided is a method for detecting defects in which scattered light generated from the sample, is concentrated to form an image and is captured and processed to extract a defect to find the positional information of the defect, and the positional information is output, wherein an image of the scattered light that suppresses the occurrence of the elongating phenomenon is formed for which partial shielding of a component of the forward scattered light, that passes through a region near the outer edge of the field of view of the objective lens, and the positional information for the defect is found from a luminance signal for a defect that is extracted from a captured scattered light image that suppresses the occurrence of the elongating phenomenon.

Growing community of inventors

Tokyo, Japan

Yuko Otani