Tokyo Electron Limited

Yuji Obata

Shigeru Kasai

Tsuneyuki Okabe

Sumi Tanaka

Mitsutoshi Ashida

Ryoji Yamazaki

A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead; a lifting and lowering mechanism configured to lift and lower the mounting table; a cylindrical section that penetrates the showerhead and communicates with the process space; and a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.

Deposition apparatus with pressure sensor and shower head on same plane and deposition method

A gas supply apparatus supplies a gas to a processing space where a gas processing is performed on a substrate. The gas supply apparatus includes: a gas supply source configured to supply a gas; a gas supply path configured to supply the gas to the processing space; an opening/closing valve configured to supply/stop the gas and provided in the gas supply path; a detector configured to detect a detectable index correlated with a Cv value of the opening/closing valve; an opening degree adjustment mechanism configured to adjust an opening degree of the opening/closing valve when the opening/closing valve is opened; and a controller configured to: store a relationship between the Cv value and the index; and control the opening degree by the opening degree adjustment mechanism such that when the index deviates from an appropriate range corresponding to an appropriate Cv value, the index falls within the appropriate range.

Gas supply apparatus, gas supply method, and substrate processing apparatus

There is provided a microwave irradiation apparatus capable of independently controlling a temperature of a target object while irradiating microwave to the target object. The microwave irradiation apparatusincludes a processing chamberconfigured to be vacuum-evacuated; a supporting tableconfigured to support the target object; a processing gas introduction unitconfigured to introduce a processing gas into the processing chamber; a microwave introduction unitconfigured to introduce the microwave into the processing chamber; a heating unitconfigured to heat the target object; a gas cooling unitconfigured to cool the target object by a cooling gas; a radiation thermometerconfigured to measure a temperature of the target object; and a temperature control unitconfigured to adjust the temperature of the target object by controlling the heating unit and the gas cooling unit based on the temperature measured by the radiation thermometer.

Growing community of inventors

Nirasaki, Japan

Yuji Obata