Advanced Semiconductor Engineering, Inc.

Yu-Pin Tsai

Yu-Ting Lu

Man-Wen Tseng

Wei-Ming Hsieh

Teck-Chong Lee

Tsung-Yueh Tsai

Cheng-Yuan Kung

Hung-Yi Lin

Meng-Wei Hsieh

Yu-Kai Lin

Yu-Cheng Tsao

Cheng-Hung Wang

Chun-Chieh Lin

Hsiu-Hsiung Yang

Li-Hao Lyu

Chieh-Ju Tsai

Che-Ting Liu

Ming-Chi Liu

Kai-Chiang Hsu

Chih-Min Pao

Cheng-I Huang

Yao-Hui Hu

Fu-Tang Chu

Ching-Feng Tseng

A semiconductor package structure and a method for manufacturing a semiconductor package structure are provided. The semiconductor package structure includes a device package and a shielding layer. The device package includes an electronic device unit and has a first surface, a second surface opposite to the first surface, and a third surface connecting the first surface to the second surface. The shielding layer is disposed on the first surface and the second surface of the device package. A common edge of the second surface and the third surface includes a first portion exposed from the shielding layer by a first length, and a common edge of the first surface and the third surface includes a second portion exposed from the shielding layer by a second length that is different from the first length.

Semiconductor package structure and method for manufacturing the same

An optical device includes a first circuit layer, a light detector, a first conductive pillar and an encapsulant. The first circuit layer has an interconnection layer and a dielectric layer. The light detector is disposed on the first circuit layer. The light detector has a light detecting area facing away from the first circuit layer and a backside surface facing the first circuit layer. The first conductive pillar is disposed on the first circuit layer and spaced apart from the light detector. The first conductive pillar is electrically connected to the interconnection layer of the first circuit layer. The encapsulant is disposed on the first circuit layer and covers the light detector and the first conductive pillar. The light detector is electrically connected to the interconnection layer of the first circuit layer through the first conductive pillar. The backside surface of the light detector is exposed from the encapsulant.

Optical device and electronic device

Optical device and method of manufacturing the same

A semiconductor package structure includes a semiconductor device with an active surface, a conductive pillar on the conductive pad, an adhesion strengthening layer, and an encapsulant in contact with the adhesion strengthening layer. The conductive pillar has a side surface and a top surface. The adhesion strengthening layer is conformally disposed on the side surface of the conductive pillar and the active surface of the semiconductor device.

Semiconductor package structure and method of manufacturing the same

A semiconductor package structure includes a wiring structure, a semiconductor module, a protection layer and a plurality of outer conductive vias. The wiring structure includes at least one dielectric layer and at least one redistribution layer. The semiconductor module is electrically connected to the wiring structure. The semiconductor module has a first surface, a second surface opposite to the first surface and a lateral surface extending between the first surface and the second surface. The protection layer covers the lateral surface of the semiconductor module and a surface of the wiring structure. The outer conductive vias surround the lateral surface of the semiconductor module, electrically connect to the wiring structure, and extend through a dielectric layer of the wiring structure and the protection layer.

A method for manufacturing a semiconductor device package includes: (1) providing a first encapsulation layer; (2) disposing an adhesive layer on the first encapsulation layer; (3) disposing a first die on the adhesive layer; and (4) forming a second encapsulation layer covering the first die, the adhesive layer, and the first encapsulation layer.

Method for manufacturing a semiconductor device package

The present disclosure relates to a semiconductor process, which includes: (a) providing a semiconductor element; (b) attaching the semiconductor element to a carrier by an adhesive layer, so that the adhesive layer is sandwiched between the semiconductor element and the carrier; and (c) cutting the semiconductor element to form a plurality of semiconductor units. Thereby, the gaps between the semiconductor units are fixed after the cutting process, so as to facilitate testing the semiconductor units.

Semiconductor process

A semiconductor device package comprises an adhesive layer, a die on the adhesive layer, a first encapsulation layer encapsulating the die and the adhesive layer, and a second encapsulation layer adjacent to the first encapsulation layer and the adhesive layer. The second encapsulation layer has a first surface and a second surface different from the first surface. A contact angle of the first surface of the second encapsulation layer is different from a contact angle of the second surface of the second encapsulation layer.

Semiconductor device package and a method of manufacturing the same

A semiconductor device package including a first encapsulation layer, a redistribution layer disposed on the first encapsulation layer, a first die disposed on the redistribution layer, a second encapsulation layer covering the first die and the redistribution layer, and an electrical connection terminal electrically connected to the redistribution layer. The first encapsulation layer has a first surface and a second surface different from the first surface. The first encapsulation layer surrounds a portion of the electrical connection terminal and exposes the electrical connection terminal.

A wafer laser-marking method is provided. First, a wafer having a first surface (an active surface) and a second surface (a back surface) opposite to each other is provided. Next, the wafer is thinned. Then, the thinned wafer is fixed on a non-UV tape such that the second surface of the wafer is attached to the tape. Finally, the laser marking step is performed, such that a laser light penetrates the non-UV tape and marks a pattern on the second surface of the wafer. According to the laser-marking method of the embodiment, the pattern is formed by the non-UV residuals left on the second surface of the wafer, and the components of the glue residuals at least include elements of silicon and carbon.

Wafer laser-making method and die fabricated using the same

A chip package includes a semiconductor substrate, conductive plugs and a chip. Wherein, the conductive plugs perforate the semiconductor substrate. Besides, the chip is disposed on a surface of the semiconductor substrate and electrically connected to the conductive plugs. Based on the above-described design, the chip package is capable of reducing the thermal stress problem caused by a coefficient of thermal expansion (CTE) dismatch compared with the prior art. The present invention discloses further a chip packaging process and furthermore a chip carrier and the process thereof.

Chip package, chip packaging, chip carrier and process thereof

A stacked structure of chips including a first chip, a second chip, an insulation layer and a first conductive element is provided. The second chip is attached to the first chip, and the back surface of the second chip faces an active surface of the first chip. The second chip includes a first contact disposed on an active surface of the second chip. The insulation layer disposed on the active surface of the first chip encapsulates the second chip. The first conductive element is formed in the insulation layer for electrically connecting one end of the first conductive element to the first contact and the other end of the first conductive element exposed outside the insulation layer. A wafer structure for making the stacked structure of chips is also provided. The stacked structure of chips has no circuit carrier, hence reducing the thickness of the stacked structure.

Stacked structure of chips and water structure for making the same

A fabricating method of wafer protection layers and a wafer structure are provided. The fabricating method includes providing a wafer first. The wafer includes pluralities of chips and has an active surface, a corresponding reverse surface and a plurality of pre-cut trenches on the active surface. On the active surface, pluralities of bumps are disposed. Next, a first curing-type protection layer and a pellicle are disposed over the active surface. Afterwards, the first curing-type protection layer is asked to contact the active surface. Besides, a second curing-type protection layer is disposed on the reverse surface. Afterward, the first and the second curing-type protection layer are cured. Finally, the wafer is cut through the pre-cut trenches to separate the chips from the wafer.

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Kaohsiung, Taiwan

Yu-Pin Tsai