Applied Materials Israel Limited

Yotam Nissim Ben Shoshan

Boris Sherman

Ran Badanes

Yehonatan Hai Ofir

There is provided a system and method of examination a semiconductor specimen. The method includes obtaining a runtime image of the specimen; processing the runtime image using a first machine learning (ML) model to extract a set of runtime features representative of a set of patches in the runtime image; and comparing the set of runtime features with a bank of reference features, giving rise to an anomaly map indicative of one or more defective patches in the runtime image. The bank of reference features is previously generated by obtaining a plurality of synthetic reference images generated by a second ML model based on a plurality of actual images; and processing the plurality of synthetic reference images by the first ML model to extract, for each synthetic reference image, a set of reference features representative thereof, giving rise to the bank of reference features.

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Rehovot, Israel

Yotam Nissim Ben Shoshan