Hitachi, Ltd.

Hitachi-high-technologies Corporation

Other

Hitachi High-tech Electronics Engineering Co., Ltd.

Renesas Technology Corp.

Yoshimasa Ohshima

Minori Noguchi

Hidetoshi Nishiyama

Akira Hamamatsu

Takahiro Jingu

Sachio Uto

Tetsuya Watanabe

Takanori Ninomiya

Yoshio Morishige

Yukio Kembo

Kenji Watanabe

Hisato Nakamura

Maki Tanaka

Shunichi Matsumoto

Kenji Oka

Shuichi Chikamatsu

Keiji Sakai

Ryouji Matsunaga

Hiroyuki Nakano

Mitsuyoshi Koizumi

Hiroshi Morioka

Masahiro Watanabe

Toshihiko Nakata

Taketo Ueno

Hisashi Hatano

Kazuhiko Matsuoka

Yukihisa Mohara

Seiji Otani

Takahiro Togashi

Yoshiharu Shigyo

Nobuyuki Akiyama

Yuzo Taniguchi

Hiroshi Yamaguchi

Yukihiro Shibata

Shinichi Suzuki

Masataka Shiba

Koji Suzuki

Hideaki Doi

Yasuhiko Hara

Hiroshi Makihira

Hiroaki Shishido

Hisafumi Iwata

Satoru Fushimi

Makiko Kohno

Kenji Mitomo

Takashi Okawa

Yuko Inoue

Keiichi Saiki

Fumiaki Endo

Tetsuyai Watanabe

A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.

Method of inspecting a semiconductor device and an apparatus thereof

An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.

Defects inspecting apparatus and defects inspecting method

A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

Method of apparatus for detecting particles on a specimen

The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.

Inspection method and inspection apparatus

A method for detecting defects on an object includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the object and white-color, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the object and passed through a filter which blocks diffraction light resulting from patterns formed on the object, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the object, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.

Method of detecting defects on an object

The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

Method for inspecting defect and apparatus for inspecting defect

An apparatus for detecting defects on a specimen including an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.

Apparatus and method for testing defects

Growing community of inventors

Yokohama, Japan

Yoshimasa Ohshima