Texas Instruments Corporation

Yoshihiro Ogata

Takayuki Niuya

Hiroyuki Yoshida

Toshiyuki Nagata

Yoichi Miyai

Takashi Inui

Katsushi Boku

Kiyotaka Okuzawa

Osaomi Enomoto

Yoshinobu Yoneoka

A dynamic RAM in which a groove (20) is formed on the main surface of a semiconductor substrate; a highly concentrated semiconductor layer (80) having one conductive type is formed inside the groove (20) to a depth sufficient to contain the first and second impurity diffusion areas (53) and (22), which are formed on the top of this groove and have the opposite conductive type; a capacitor C.sub.1 formed inside the groove (20), while a transfer gate Tr.sub.1 is formed on the highly concentrated semiconductor layer (80); and the diffusion area (53) is used to connect them.

Trench-type semiconductor memory device

A type of semiconductor device with a configuration characterized by the fact that an electroconductive film (90) is formed beforehand in connection to step (54a) of insulating film(54), and an electroconductive layer (63) with step from the aforementioned electroconductive film is coated to form the side contact of the memory cell. Even in the case when breakage takes place in electroconductive layer (63), the electrical conduction is still maintained via electroconductive film (90), and no wire breakage, in effect, takes place. In addition, it is possible to form the pattern for the aforementioned electroconductive layer by, for instance, etching back method without applying a special mask; hence, the manufacturing process is simplified.

Method of forming a trench-type semiconductor memory device

A semiconductor memory device characterized by the fact that the disturb test time of the semiconductor memory device can be shortened, and the power consumption can be cut. In the disturb test for the semiconductor memory device in this invention, multiple word lines are selected at the same time with a prescribed interval corresponding to the element isolation layout. As the word lines are selected corresponding to the element isolating layout, the interference caused by the element isolation state can be excluded. Since multiple word lines are selected at the same time, the time of operation can be shortened. Since the word lines are maintained in the selected state while the sense amplifiers are not reset, there is no increase in the power consumption although multiple word lines are selected at the same time.

Semiconductor memory device

A type of semiconductor device with a configuration characterized by the fact that an electroconductive film (90) is formed beforehand in connection to step (54a) of insulating film (54), and an electroconductive layer (63) with step from the aforementioned electroconductive film is coated to form the side contact of the memory cell. Even in the case when breakage takes place in electroconductive layer (63), the electrical conduction is still maintained via substrate electroconductive film (90), and no wire breakage, in effect, takes place. In addition, it is possible to form the pattern for the aforementioned electroconductive layer by, for instance, etching back method without applying a special mask; hence, the manufacturing process is simplified.

French-type semiconductor memory device with enhanced trench

A process is disclosed herein for increasing yield in a semiconductor circuity having redundant circuitry for replacing defective normal circuitry in the semiconductor integrated circuit. In the first step, an insufficient sinter operation (50) is carried out in a hydrogen atmosphere at a temperature of less than 350.degree. C. At this temperature, no significant change will be seen in the interface trap density. Thereafter, the integrated circuit is tested (54,56) and the defective normal circuitry then is replaced (58) with the redundant circuitry. The integrated circuit is then subjected to a sufficient sinter operation (64) which is an operation wherein the substrate is disposed at a temperature between 350.degree. C.-500.degree. C. for more than 30 minutes. This sufficient sinter operation is performed in a hydrogen atmosphere, allowing dangling bonds at the interface to be terminated with hydrogen. Preferable, the optimal temperature for the sufficient sinter is approximately 400.degree. C. The integrated circuit is then subjected to a reliability and burn-in procedure.

Two-step sinter method utilized in conjunction with memory cell

A semiconductor device in which a trench-shaped groove (20) and a depression (100), which is formed by removing at least part of the area above and adjacent to the groove, are formed to be continuous on one side of the semiconductor substrate, in which aforementioned groove and aforementioned depression is buried a polysilicon conductive layer (103), the top of which conductive layer is converted into an insulator (102), the bottom of which insulating film (102) is contained in the depression (100).

Method of manufacturing a semiconductor device

A semiconductor memory device characterized by the fact that the disturb test time of the semiconductor memory/device can be shortened, and the power consumption can be cut. In the disturb test for the semiconductor memory device in this invention, multiple word lines are selected at the same time with a prescribed interval corresponding to the element isolation layout. As the word lines are selected corresponding to the element isolating layout, the interference caused by the element isolation state can be excluded. Since multiple word lines are selected at the same time, the time of operation can be shortened. Since the word lines are maintained in the selected state while the sense amplifiers are not reset, there is no increase in the power consumption although multiple word lines are selected at the same time.

A semiconductor device in which a trench-shaped groove (20) and a depression (100), which is formed by removing at least part of the area above and adjacent to the groove, are formed to be continuous on one side of the semiconductor substrate, in which aforementioned groove and aforementioned depression is buried a polysilicon conductive layer (103), the top of which conductive layer is converted into an insulator (102), the bottom of which insulating film (102) is contained in the depression (100). It is possible to form the element areas according to designs, and it is also possible to flatten the surface without wire cutting in the conductive layer.

Semiconductor device and method of manufacturing the same

Substrate bias generating circuit for MIS semiconductor device comprising an oscillating circuit, a capacitor, an MOS transistor and a Schottky barrier diode. One end of the oscillating circuit is connected to a V.sub.ss terminal which provides a reference potential. The capacitor is connected at one end thereof to the other end of the oscillating circuit. The MOS transistor is connected between the V.sub.ss terminal and the other end of the capacitor, with the Schottky barrier diode being connected between a node located between the other end of the capacitor and the MOS transistor, and the substrate. The Schottky barrier diode is operated by the majority carrier, thereby enabling the majority charge to be directly pumped out of the substrate and into the terminal V.sub.ss through the Schottky barrier diode with stability without requiring an injection of the minority charge into the semiconductor substrate. The pumping of the charge out of the substrate is permitted by lowering the potential of the node through the oscillating circuit.

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Ibaraki, Japan

Yoshihiro Ogata