Intel Corporation

Other

University of Central Florida Research Foundation, Inc.

Yonggang Li

Islam A Salama

Kristof Darmawikarta

Dilan Seneviratne

Charan K Gurumurthy

Brandon C Marin

Srinivas V Pietambaram

Jeremy D Ecton

Aleksandar Aleksov

Rahul N Manepalli

Nathaniel R Quick

Mihir K Roy

Aravinda Kar

Gang Duan

Sameer Paital

Raymond R McNeice

Digvijay Ashokkumar Raorane

Javier Soto Gonzalez

Suddhasattwa Nad

Hamid Azimi

Haobo Chen

Leonel R Arana

Omar James Bchir

Houssam Jomaa

Tarek A Ibrahim

Xiwang Qi

Chong Zhang

Bai Nie

Amruthavalli Palla Alur

Aritra Dhar

Devarajan Balaraman

Jon M Williams

Johanna M Swan

Adel A Elsherbini

Robert L Sankman

Omkar G Karhade

John Stephen Guzek

Pooya Tadayon

Ravi Kiran Nalla

Vivek Raghunathan

Pramod Malatkar

Xavier Francois Brun

Dingying David Xu

Praneeth Kumar Akkinepally

Changhua Liu

Frank Truong

Xiaoying Guo

Richard J Harries

Meizi Jiao

Kyle Yazzie

Yosuke Kanaoka

Jason M Gamba

Jung Kyu Han

Darko Grujicic

Hongxia Feng

Matthew L Tingey

Srinivas Venkata Ramanuja Pietambaram

Jesse Jones

Benjamin Duong

Ching-Ping Janet Shen

Mengzhi Pang

Hari Mahalingam

Shivasubramanian Balasubramanian

Ravi Shankar

Rengarajan Shanmugam

Vahidreza Parichehreh

Bohan Shan

Naga Sivakumar Yagnamurthy

Yosef Kornbluth

Mahadevan Suryakumar

Trina Ghosh Dastidar

Xiaoxuan Sun

Xuefei Wan

Melissa Wette

Sirisha Chava

Vinith Bejugam

Samuel George

Deniz Turan

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die, having a first surface and an opposing second surface, in a first layer; a redistribution layer (RDL) on the first layer, wherein the RDL includes conductive vias having a greater width towards a first surface of the RDL and a smaller width towards an opposing second surface of the RDL; wherein the first surface of the RDL is electrically coupled to the second surface of the first die by first solder interconnects having a first solder; and a second die in a second layer on the RDL, wherein the second die is electrically coupled to the RDL by second solder interconnects having a second solder, wherein the second solder is different than the first solder.

Microelectronic assemblies including interconnects with different solder materials

The present disclosure is directed to semiconductor dies and methods that provide a glass substrate, a pulsed laser tool to produce a line-shaped modification to the glass substrate for forming a plurality of structures in the glass substrate. The pulse laser tool may be provided with a predetermined pattern for its movement. The predetermined pattern moves the pulsed laser tool in a series of single steps in a first axial direction and in a series of plural lateral steps in a second axial direction that is perpendicular to the first axial direction, in particular, the single step is followed by the plural lateral steps in a repeating sequence. The series of plural lateral steps form an assembly of line-shaped modifications in parallel rows on the glass substrate, and thereafter the plurality of structures may be formed from the parallel rows of line-shaped modifications in the glass substrate.

Optimization for raster scanning

Various embodiments disclosed relate to photonic assemblies. The present disclosure includes methods for packaging a photonic assembly, including attaching a bridge die to a glass substrate, attaching an electronic integrated circuit die to the glass substrate and the bridge die, attaching a photonic integrated circuit die to the glass substrate and the bridge die, bonding a coupling adapter to the glass substrate and in situ forming a waveguide in the coupling adapted, the waveguide aligning with the photonic integrated circuit die.

Die last and waveguide last architecture for silicon photonic packaging

The present disclosure is directed to a carrier chuck having a base plate with a top surface, at least one electrode positioned in a first carrier region of the top surface and configured to produce an electrostatic force to retain a panel placed on the carrier chuck during panel processing, and a dielectric layer positioned over the at least one electrode. The at least one electrode extends from the top surface by a height of at least 20 um.

Carrier chuck and methods of forming and using thereof

Described are microelectronic devices including an embedded microelectronic package for use as an integrated voltage regulator with a microelectronic system. The microelectronic package can include a substrate and a magnetic foil. The substrate can define at least one layer having one or more of electrically conductive elements separated by a dielectric material. The magnetic foil can have ferromagnetic alloy ribbons and can be embedded within the substrate adjacent to the one or more of electrically conductive elements. The magnetic foil can be positioned to interface with and be spaced from the one or more of electrically conductive element.

Substrate embedded magnetic core inductors and method of making

Conductive routes for an electronic substrate may be fabricated by forming an opening in a material, using existing laser drilling or lithography tools and materials, followed by selectively plating a metal on the sidewalls of the opening. The processes of the present description may result in significantly higher patterning resolution or feature scaling (up to 2× improvement in patterning density/resolution). In addition to improved patterning resolution, the embodiments of the present description may also result in higher aspect ratios of the conductive routes, which can result in improved signaling, reduced latency, and improved yield.

Conductive route patterning for electronic substrates

A die assembly is disclosed. The die assembly includes a die, one or more die pads on a first surface of the die and a die attach film on the die where the die attach film includes one or more openings that expose the one or more die pads and that extend to one or more edges of the die.

Patternable die attach materials and processes for patterning

Embodiments include package substrates and a method of forming the package substrates. A package substrate includes a dielectric having a cavity that has a footprint, a resistor embedded in the cavity of the dielectric, and a plurality of traces on the resistor, where a plurality of surfaces of the resistor are activated surfaces. The resistor may also have a plurality of sidewalls which may be activated sidewalls and tapered. The dielectric may include metallization particles/ions. The resistor may include resistive materials, such as nickel-phosphorus (NiP), aluminum-nitride (AlN), and/or titanium-nitride (TiN). The package substrate may further include a first resistor embedded adjacently to the resistor. The first resistor may have a first footprint of a first cavity that is different than the footprint of the cavity of the resistor. The resistor may have a resistance value that is thus different than a first resistance value of the first resistor.

Selective deposition of embedded thin-film resistors for semiconductor packaging

A method of fabricating an RF filter on a semiconductor package comprises forming a first dielectric buildup film. A second dielectric buildup film is formed over the first dielectric buildup film, the second dielectric buildup film comprising a dielectric material that contains a metallization catalyst, wherein the dielectric material comprises one of an epoxy-polymer blend dielectric material, silicon dioxide and silicon nitride, and a low-k dielectric. A trench is formed in the second dielectric buildup film with laser ablation, wherein the laser ablation selectively activates sidewalls of the trench for electroless metal deposition. A metal selectively is plated to sidewalls of the trench based at least in part on the metallization catalyst and immersion in an electroless solution. A low-loss buildup film is formed over the metal that substantially fills the trench.

Fabricating an RF filter on a semiconductor package using selective seeding

Embodiments include one or more air core inductors (ACIs) and a method of forming the ACIs. The ACI includes a first inductor loop on a substrate. The first inductor loop has a first line and a second line. The first line has a first thickness that is greater than a second thickness of the second line. The ACI also includes a dielectric over the substrate and the first and second lines. The first line has a top surface above a top surface of the second line. The ACI further includes a second inductor loop on the dielectric and the first inductor loop. The second inductor loop has is coupled to the top surface of the first line of the first inductor loop. The first inductor loop may also have a third thickness, where the third thickness is the distance between the top surfaces of the first and second line.

In-situ component fabrication of a highly efficient, high inductance air core inductor integrated into substrate packages

A filter structure comprises a first dielectric buildup film. A second dielectric buildup film is over the first dielectric buildup film, the second dielectric buildup film including a metallization catalyst. A trench is in the second dielectric buildup film. A metal is selectively plated to sidewalls of the trench based at least in part on the metallization catalyst. A low-loss buildup film is over the metal that substantially fills the trench.

An electronic package that includes a substrate and an electronic component attached to the substrate. A laminated layer is attached to an upper surface of the substrate such that the laminated layer covers the electronic component. The electronic package may further include a stiffener mounted on the laminated layer where the stiffener is over the electronic component.

Electronic package that includes lamination layer

A package for an electronic device may include a first layer. The first layer may include a first dielectric material. The first layer may have a planar first surface. The first layer may have a variable thickness. A second layer may be coupled to the first layer. The second layer may include a second dielectric material and may have a planar second surface. The second layer may have a variable thickness. A seam may be located at an interface between the first layer and the second layer, and the seam may have an undulating profile. The package may include at least one electrical trace, for example located in the first layer or the second layer.

Electronic device package with reduced thickness variation

Discussed generally herein are methods and devices for flexible fabrics or that otherwise include thin traces. A device can include a flexible polyimide material, and a first plurality of traces on the flexible polyimide material, wherein the first plurality of traces are patterned on the flexible polyimide material using laser spallation.

Thin electronic package elements using laser spallation

Growing community of inventors

Chandler, AZ, United States of America

Yonggang Li