Taiwan Semiconductor Manufacturing Comp. Ltd.

Yin-Lang Wang

Wen-Kung Cheng

Hung-Ju Chien

Yuan-Hung Chiu

Yi-Lung Cheng

Ying-Hsiang Chen

Chun-Ching Tsan

A method for cleaning residual material from a chemical vapor deposition (CVD) apparatus in situ employing dry etching. There is first employed a high density plasma chemical vapor deposition (HDP-CVD) method to deposit layers of silicon oxide material upon substrates within a chemical vapor deposition reactor apparatus. After removal of substrates, the reactor chamber is closed off. The interior of the reactor is then filled with a gas and a plasma formed therewithin, to which oxygen is added and the reactor allowed to come to an increased temperature and bake for a period of time. The reactor power is then turned off and the reactor evacuated. There is then carried out a normal cleaning step within the reactor chamber employing a reactive gas such as NF , with greater cleaning efficiency due to the increased temperature caused by the baking step.

Method for improved cleaning in HDP-CVD process with reduced NF3 usage

A template for measuring the edge width on a disk that is not covered by a coating layer on a top surface of the disk and a method for using such template are disclosed. The template is made of a substantially transparent sheet that has a contour substantially the same as the contour of the disk to be measured. A series of marks are provided on a top surface of the sheet along a peripheral edge of the sheet at numerous predetermined distances from the peripheral edge. The marks may be provided in scribed thin lines, or the marks may be provided in scribed thin lines that are color coded for easier identification purpose. The present invention novel template can be most suitably used on a silicon wafer of any size. However, it can also be used on a disk of any shape or contour to produce the same desirable result.

Template for measuring edge width and method of using

A new method of forming a plasma-enhanced silicon-rich oxynitride layer having improved uniformity across the wafer in terms of layer thickness, refractivity, and reflectivity by using argon as the inert carrier gas is described. A semiconductor substrate is provided which may include semiconductor device structures. An Argon-based silicon-rich oxynitride etch stop layer is deposited overlying the semiconductor substrate. An oxide layer is deposited overlying the Argon-based silicon-rich oxynitride etch stop layer. An opening is etched through the oxide layer stopping at the Argon-based silicon-rich oxynitride etch stop layer. Thereafter, the Argon-based silicon-rich oxynitride etch stop layer within the opening is removed. The opening is filled with a conducting layer. This Argon-based silicon-rich oxynitride layer has improved uniformity across the wafer in terms of layer thickness, refractivity, and reflectivity as compared with a helium-based silicon-rich oxynitride layer.

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Tai-Chung, Taiwan

Yin-Lang Wang