Taiwan Semiconductor Manufacturing Comp. Ltd.

Yin-Bin Tseng

Kai-Shiung Hsu

Chun-Sheng Wu

Jia-Wei Xu

Contamination from outgassing during a deposition process is addressed by a series of equipment enhancements, including throttle valves, a dual air curtain, and a residual gas analysis (RGA) monitor. The dual air curtain can be configured to flow a first gas during wafer processing and a second gas during wafer unloading, to re-direct and capture outgassed species. The dual air curtain and the throttle valves can be programmed in an automated feedback control system that utilizes data from the RGA monitor.

Growing community of inventors

Hsinchu, Taiwan

Yin-Bin Tseng