Taiwan Semiconductor Manufacturing Comp. Ltd.

Macronix International Co., Ltd.

Skymedi Corporation

Magic Control Technology Corporation

Macroniz Interntaional Co., Ltd.

Yi-Ching Liu

Yih Wang

Chia-En Huang

Meng-Han Lin

Meng-Sheng Chang

Chieh Lee

Sai-Hooi Yeong

Yu-Ming Lin

Peng-Chun Liou

Sheng-Chen Wang

Chia-en Huang

Zhiqiang Wu

Han-Jong Chia

Ya-Yun Cheng

Chung-Te Lin

Feng-Cheng Yang

Chia-Ta Yu

Chung-Wei Wu

Chenchen Jacob Wang

Shin-Jang Shen

Wen-Chang Cheng

Chun-Hsiung Hung

Hang-Ting Lue

Bo-Feng Young

Jonathan Tsung-Yung Chang

Teng-Hao Yeh

Chun-Ying Lee

Fuja Shone

I-Long Lee

Chi Lo

Chih-Ting Hu

Jen-Yuan Chang

Sheng-Chih Lai

Chun-Chieh Lu

Shuo-Nan Hung

Yao-Jen Yang

Ming-Hung Chou

Hung-Sheng Chang

Chen-Jun Wu

Hsien-Hung Wu

Chia-Ching Li

Pei-Chun Liao

Chih-He Chiang

Hsin-Chien Chen

Tzung-Shen Chen

Wen-Lin Chang

Ming-Te Chang

Yu-Kai Chang

Wen-Ling Lu

Kuan-Chung Chiu

Wei-Chi Su

Cheng-Hsuan Liu

Shuo-Nan Hong

Chang Jen-Yuan

Min-Chieh Tsai

Chin-Ming Yang

Wei-Hua Chen

Rose Tseng

Lin-Kai Huang

A semiconductor device includes a substrate, an active structure, a memory structure, and a first conductive line. The active structure is disposed on the substrate. The memory structure is disposed over the active structure, and has a lower surface and an upper surface opposite to each other. The memory structure includes a deep via disposed in the memory structure, and extends in an upward direction from the lower surface to terminate at the upper surface. The first conductive line is disposed above the upper surface of the memory structure, and extends in a first lengthwise direction transverse to the upward direction. The first conductive line is electrically connected to the active structure through the deep via. A method for manufacturing the semiconductor device is also disclosed.

Memory structure having novel circuit routing and method for manufacturing the same

Systems and methods disclosed herein are related to a memory system. In one aspect, the memory system includes a first set of memory cells including a first string of memory cells and a second string of memory cells; and a first switch including: a first electrode connected to first electrodes of the first string of memory cells and first electrodes of the second string of memory cells, and a second electrode connected to a first global bit line, wherein gate electrodes of the first string of memory cells are connected to a first word line and gate electrodes of the second string of memory cells are connected to a second word line.

Using split word lines and switches for reducing capacitive loading on a memory system

An SRAM cell includes a first n-type channel (n-channel) layer engaged with a first gate layer to form a first device; a first p-type channel (p-channel) layer engaged with the first gate layer to form a second device, the first gate layer stacked between the first n-channel layer and the first p-channel layer along a first direction; a second n-channel layer engaged with a second gate layer to form a third device, the second gate layer coupled to a first word line and the second n-channel layer coupled to the first n-channel layer along a second direction perpendicular to the first direction; a third n-channel layer engaged with a third gate layer to form a fourth device, the third n-channel layer spaced from the second n-channel layer along a third direction perpendicular to the first direction and the second direction; a second p-channel layer engaged with the third gate layer to form a fifth device, the third gate layer stacked between the third n-channel layer and the second p-channel layer along the first direction; and a fourth n-channel layer engaged with a fourth gate layer to form a sixth device, the fourth gate layer coupled to a second word line and the fourth n-channel layer coupled to the third n-channel layer along the second direction.

Structures of sram cell and methods of fabricating the same

Disclosed herein are related to a memory array including a set of memory cells and a set of switches to configure the set of memory cells. In one aspect, each switch is connected between a corresponding local line and a corresponding subset of memory cells. The local clines may be connected to a global line. Local lines may be metal rails, for example, local bit lines or local select lines. A global line may be a metal rail, for example, a global bit line or a global select line. A switch may be enabled or disabled to electrically couple a controller to a selected subset of memory cells through the global line. Accordingly, the set of memory cells can be configured through the global line rather than a number of metal rails to achieve area efficiency.

Switches to reduce routing rails of memory system

One aspect of this description relates to a semiconductor device. In some embodiments, the semiconductor device includes a first drain/source structure extending in a first direction, a second drain/source structure extending the first direction and spaced from the first drain/source structure in a second direction perpendicular to the first direction, a third drain/source structure extending in the first direction and spaced from the second drain/source structure in the second direction, a first bit line disposed over the first drain/source structure in the first direction, a common select line that includes a portion disposed over the second drain/source structure in the first direction, a second bit line disposed over the third drain/source structure in the first direction, and a charge storage layer coupled to at least a first sidewall of each of the first drain/source structure, the second drain/source structure, and the third drain/source structure.

Common-connection method in 3D memory

A memory circuit includes a boundary layer, a first circuit positioned on a first side of the boundary layer and including a DRAM array including a plurality of DRAM cells, a second circuit positioned on a second side of the boundary layer opposite the first side and including a computation circuit, the computation circuit including a sense amplifier circuit, and a plurality of bit lines coupled to the plurality of DRAM cells and the sense amplifier circuit. Each bit line of the plurality of bit lines includes a via structure positioned in the boundary layer and the plurality of DRAM cells of the first circuit positioned on the first side of the boundary layer is an entirety of the DRAM cells of the memory circuit coupled to the sense amplifier circuit.

DRAM computation circuit and method

A circuit is provided. The circuit includes a first die that includes a memory array, and the memory array includes a plurality of memory cells, a sensing element coupled to the plurality of memory cells, and a first plurality of conductive pads coupled to the sensing element. The circuit also includes a second die that includes an address decoder associated with the memory array of the first die and a second plurality of conductive pads coupled to the address decoder. The first die is coupled to the second die by an interposer. The address decoder of the second die is coupled to the sensing element of the first die. A first voltage swing of the first die is larger than a second voltage swing of the second die.

Memory circuits

Disclosed herein are systems, methods and apparatuses related to a memory array. In one aspect, the memory array includes a set of resistive storage circuits including a first subset of resistive storage circuits connected between a first local line and a second local line in parallel. The first local line and the second local line may extend along a first direction. In one aspect, for each resistive storage circuit of the first subset of resistive storage circuits, current injected at a first common entry point of the first local line exits through a first common exit point of the second local line, such that each resistive storage circuit of the first subset of resistive storage circuits may have same or substantial equal resistive loading.

Memory including metal rails with balanced loading

A memory device, a semiconductor device and manufacturing methods for forming the memory device and the semiconductor device are provided. The memory device includes a stacking structure, a switching layer, channel layers and pairs of conductive pillars. The stacking structure includes alternately stacked isolation layers and word lines, and extends along a first direction. The stacking structure has a staircase portion and a connection portion at an edge region of the stacking structure. The connection portion extends along the staircase portion and located aside the staircase portion, and may not be shaped into a staircase structure. The switching layer covers a sidewall of the stacking structure. The channel layers cover a sidewall of the switching layer, and are laterally spaced apart from one another along the first direction. The pairs of conductive pillars stand on the substrate, and in lateral contact with the switching layer through the channel layers.

Three-dimensional memory device with word lines extending through sub-arrays, semiconductor device including the same and method for manufacturing the same

A semiconductor device comprises a first conductive structure extending along a vertical direction and a second conductive structure extending along the vertical direction. The second conductive structure is spaced apart from the first conductive structure along a lateral direction. The semiconductor device further comprises a plurality of third conductive structures each extending along the lateral direction. The plurality of third conductive structures are disposed across the first and second conductive structures. The first and second conductive structures each have a varying width along the lateral direction. The plurality of third conductive structures have respective different thicknesses in accordance with the varying width of the first and second conductive structures.

Semiconductor memory devices and methods of manufacturing thereof

A semiconductor device includes a first conductive structure extending along a vertical direction and a second conductive structure extending along the vertical direction. The second conductive structure is spaced apart from the first conductive structure along a first lateral direction. The semiconductor device includes third conductive structures each extending along the first lateral direction. The third conductive structures are disposed across the first and second conductive structures. The semiconductor device includes a first semiconductor channel extending along the vertical direction. The first semiconductor channel is disposed between the third conductive structures and the first conductive structure, and between the third conductive structures and the second conductive structure. The first and second conductive structures each have a first varying width along the first lateral direction, and the first semiconductor channel has a second varying width along a second lateral direction.

Semiconductor memory devices with varying channel width and methods of manufacturing thereof

One aspect of this description relates to a memory array. In some embodiments, the memory array includes a first memory cell coupled between a first local select line and a first local bit line, a second memory cell coupled between a second local select line and a second local bit line, a first switch coupled to a global bit line, a second switch coupled between the first local bit line and the first switch, and a third switch coupled between the second local select line and the first switch.

Using embedded switches for reducing capacitive loading on a memory system

A memory device including a memory array configured to store data, a sense amplifier circuit coupled to the memory array, and a read circuit coupled to the sense amplifier circuit, wherein the read circuit includes a first input that receives a read column select signal for activating the read circuit to read the data out of the memory array through the read circuit during a read operation.

Sense amplifier with read circuit for compute-in-memory

A memory device includes a first signal line, a second signal line, a first memory cell and a plurality of second memory cells. The first memory cell is coupled to the first signal line. Each of the second memory cells has a first terminal coupled to the first signal line through the first memory cell and a second terminal coupled to the second signal line.

Memory device comprising second memory cell having first terminal coupled to first signal line through first memory cell

A memory circuit includes a first memory cell on a first layer, a second memory cell on a second layer different from the first layer, a first select transistor on a third layer different from the first layer and the second layer, and a first bit line extending in a first direction, and being coupled to the first memory cell and the second memory cell. The memory circuit further includes a first source line extending in the first direction, being coupled to the first memory cell, the second memory cell and the first select transistor, and being separated from the first bit line in a second direction different from the first direction. memory circuit includes a second source line extending in the first direction, and being coupled to the first select transistor.

Memory circuit and method of operating same

Growing community of inventors

Hsinchu, Taiwan

Yi-Ching Liu