Nagase Co., Ltd.

Nagase Cms Technology Co., Ltd.

Hirama Laboratories Co., Ltd.

Yasuyuki Kobayakawa

Shu Ogawa

Makoto Kikukawa

Toshimoto Nakagawa

Yuko Katagiri

Yoshitaka Nishijima

Yutaka Saito

Yoshiya Kitagawa

A processing solution preparation and supply apparatus includes a dissolving preparation bath to which a material powder and ultrapure water are supplied. This dissolving preparation bath is connected to a substrate processing apparatus via a pipe, and a processing solution prepared from the material powder on-site is supplied to the processing apparatus. To reduce an increase in the microorganism concentration in the ultrapure water, this ultrapure water is circulated substantially constantly. This suppresses deterioration and concentration fluctuations of a processing solution for use in processing of a semiconductor substrate, when this processing solution is supplied to the use side. This also reduces particles and improves the economical efficiency.

Processing solution preparation and supply method and apparatus

A developer liquid regenerating system is provided with a storage tank storing a TAAH (such as TMAH)- and photoresist-containing developer waste liquid, first separating means with NF membrane, connected to the waste liquid storage tank through conduits, a storage tank connected to the first separating means through a conduit, and second separating means with NF membrane, connected to the storage tank through conduits. The developer liquid regenerating system is also connected to a developing apparatus through a conduit connected to the storage tank, and to a developer liquid control/supply apparatus through a conduit connected to the storage tank.

Developer waste liquid regenerating apparatus and method

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Tokyo, Japan

Yasuyuki Kobayakawa