Renesas Electronics Corporation

Nec Corporation

Nec Electronics Corporation

Other

Epson Toyocom Corporation

Yasutaka Nakashiba

Hiroaki Ohkubo

Masayuki Furumiya

Tetsuya Iida

Keisuke Hatano

Shinichi Watanuki

Shinichi Uchida

Shinichi Kuwabara

Tohru Kawai

Kenta Ogawa

Yutaka Akiyama

Ichiro Murakami

Tsuyoshi Nagata

Teruhiro Kuwajima

Akira Matsumoto

Naoki Oda

Hiroshi Murase

Tokuhito Sasaki

Ryota Yamamoto

Nobukazu Ito

Naoyoshi Kawahara

Takasuke Hashimoto

Masaru Wakabayashi

Takatsugu Nemoto

Masaya Kawano

Yoshinori Muramatsu

Hiroyuki Kunishima

Susumu Kurosawa

Makoto Koshimizu

Akira Tanabe

Yoshinao Miura

Kuniko Kikuta

Satoshi Uchiya

Takafumi Kuramoto

Seigo Namioka

Mitsuji Okada

Shigeharu Nakata

Shuuichi Kagawa

Tatsuya Usami

Yoshiaki Yamamoto

Keiji Sakamoto

Toshiyuki Hata

Ken Ozawa

Taro Moriya

Akihiro Shimomura

Yuki Fujimoto

Saya Shimomura

Takashi Iwadare

Yuji Surisawa

Akio Ono

Kazunori Go

Hiroshi Oe

Noriko Yoshikawa

Masayuki Ishikawa

Noriaki Oda

Yoshiyuki Sato

Masaharu Sato

Shinichi Kawai

Hiroshi Yanagigawa

Takuji Onuma

Sadaaki Masuoka

Tomoo Nakayama

Makoto Nakayama

Katsumi Yamamoto

Tsuyoshi Ohshima

Kazuhisa Mori

Mieko Hasegawa

Keiichi Hara

Tohru Yamada

Junichi Yamamoto

Shigehisa Kurogo

Jun Kishi

A semiconductor device includes: a first semiconductor chip including a first MOSFET of n-type and a first parasitic diode; and a second semiconductor chip including a second MOSFET of n-type and a second parasitic diode. A first source electrode and a first gate wiring are formed in a first front surface of the first semiconductor chip, and a first drain electrode is formed in a first back surface of the first semiconductor chip. A second source electrode and a second gate wiring are formed in a second front surface of the second semiconductor chip, and a second drain electrode is formed in a second back surface of the second semiconductor chip. The first front surface and the second front surface face each other such that the first source electrode and the second source electrode are in contact with each other via a conductive paste.

Semiconductor device and circuit device

A semiconductor device includes: a first semiconductor chip mounted on a chip mounting portion via a first bonding material; and a second semiconductor chip mounted on the first semiconductor chip. Here, the first semiconductor chip has: a protective film located in an uppermost layer; and a first pad electrode exposed from the protective film at an inside of a first opening portion of the protective film. Also, the second semiconductor chip is mounted on a conductive material, which is arranged on the first pad electrode of the first semiconductor chip, via a second bonding material of an insulative property.

Semiconductor device including chip-to-chip bonding

The source region, drain region, buried insulating film, gate insulating film, and gate electrode of the semiconductor device are formed in a main surface of a semiconductor substrate. The buried insulating film is buried in a first trench formed between the source and drain regions. The first trench has a first side surface and a first bottom surface. The first side surface faces the source region in a first direction extending from one of the source and drain regions to the other. The first bottom surface is connected to the first side surface and is along the main surface of the semiconductor substrate. A crystal plane of a first surface of the semiconductor substrate, which is the first side surface of the first trench, is (111) plane. A crystal plane of a second surface of the semiconductor substrate, which is the bottom surface of the first trench, is (100) plane.

Semiconductor device and method of manufacturing the same

A semiconductor device has a semiconductor substrate, a first insulating layer, a first inductor, a second insulating layer, a second inductor, a pad and an annular wiring. The first insulating layer is formed on the semiconductor substrate. The first inductor is directly formed on the first insulating layer. The second insulating layer is formed on the first insulating layer such that the second insulating layer covers the first inductor. The second inductor is directly formed on the second insulating layer such that the second inductor faces the first inductor. The pad is directly formed on the second insulating layer. The pad is electrically connected with the second inductor. The annular wiring is electrically connected with the pad. The annular wiring is spaced apart from the second inductor. The annular wiring surrounds the second inductor without forming a vertex in plan view.

Semiconductor device

In semiconductor device, a field plate portion having a high concentration p-type semiconductor region, a low concentration p-type semiconductor region having a lower impurity concentration than the high concentration p-type semiconductor region and a high concentration n-type semiconductor region is provided. Then, the high concentration p-type semiconductor region is electrically connected to the source region while the high concentration n-type semiconductor region is electrically connected to the drain region.

A semiconductor device includes a semiconductor substrate, a gate dielectric film formed on the semiconductor substrate, a gate electrode formed on the gate dielectric film, a field plate portion which is integrally formed with the gate electrode, a step insulating film in contact with the field plate portion, a high dielectric constant film in contact with the step insulating film and having a higher dielectric constant than silicon.

A semiconductor device includes a semiconductor substrate, a semiconductor element, and a multilayer wiring. The semiconductor element is formed on the semiconductor substrate. The multilayer wiring includes a wiring electrically connected with the semiconductor element, and a first inductor. The multilayer wiring is formed on the semiconductor substrate such that the multilayer wiring covers the semiconductor element. The first inductor is formed such that the first inductor electrically isolated from the wiring and is magnetically connected with the wiring.

A semiconductor device includes: a semiconductor substrate; an insulating layer formed on the semiconductor substrate; an optical waveguide formed on the insulating layer, extending in a first direction in a plan view, and being made of silicon; and an interlayer insulating film formed on the insulating layer to cover the optical waveguide. In this case, a crystal surface of a side surface of the optical waveguide is a () surface.

A semiconductor device includes: a first substrate; a multilayer wiring layer formed on the first substrate; a first inductor formed into a meander shape on the multilayer wiring layer in a plan view; and a second inductor formed into a meander shape on the multilayer wiring layer in a plain view, and arranged so as to be close to the first inductor in a plan view and not to overlap with the first inductor. A transformer is configured by the first inductor and the second inductor and, in a plan view, the first inductor and the second inductor extend along a first direction in which one side of the first substrate extends.

A semiconductor device has a substrate, a first circuit, a first inductor, a second circuit and a second inductor IND. The substrate includes a first region and a second region, which are regions different from each other. The first circuit is formed on the first region. The first inductor is electrically connected with the first circuit. The second circuit is formed on the second regions. The second inductor is electrically connected with the second circuit and formed to face the first inductor. A penetrating portion is formed in the substrate. The penetrating portion is formed such that the penetrating portion surrounds one or both of the first circuit and the second circuit in plan view.

A semiconductor device includes a first semiconductor chip, an adhesive layer that is formed on the first semiconductor chip, and a second semiconductor chip that is arranged on the first semiconductor chip via the adhesive layer. The first semiconductor chip has a first semiconductor substrate and a first wiring layer. The first wiring layer has a first inductor and a first electrode pad. The first wiring layer is formed on the first semiconductor substrate. The second semiconductor chip has a second wiring layer and a second semiconductor substrate. The second wiring layer is formed on the first wiring layer via the adhesive layer. The second semiconductor substrate is formed on the second wiring layer, and has a first opening. In a plan view, the first electrode pad is formed so as not to overlap with the second semiconductor chip, and a second electrode pad overlaps with the first opening.

A semiconductor device includes a cladding layer and a first optical waveguide. The first optical waveguide is formed on the first cladding layer. An end surface of the first optical waveguide is inclined relative to a vertical line perpendicular to an upper surface of the cladding layer.

A semiconductor device has a first area in which first and third semiconductor elements are formed, a second area in which second and fourth semiconductor elements are formed, and a third area located between the first and second areas. On the first to fourth semiconductor elements, a multilayer wiring layer including first and second inductors is formed. A through hole penetrating the semiconductor substrate is formed in the third area, and a first element isolation portion protruding from a front surface side of the semiconductor substrate toward a back surface side of the semiconductor substrate is formed in the through hole. Further, on the back surface side of the semiconductor substrate, the semiconductor substrate in the first area is mounted on the first die pad, and the semiconductor substrate in the second area is mounted on the second die pad.

A semiconductor device has a first semiconducting layer including an optical waveguide, a dielectric layer formed on the optical waveguide, and a conductive layer formed on the dielectric layer. A refractive index of a material of the conductive layer is smaller than a refractive index of a material of the first semiconductor layer.

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Kanagawa, Japan

Yasutaka Nakashiba