Nikon Corporation

Yasushi Fukutomi

Yutaka Ichihara

Mikihiko Ishii

Jun Kawakami

Tetsuji Onuki

Hiroyuki Matsushiro

Hisashi Shiozawa

Masaya Miyazaki

A point diffraction interference measuring method comprises forming a substantially ideal spherical wave by using a point light source-generating unit, allowing a light flux composed of the spherical wave to pass through a test sample, thereafter dividing the light flux into two light fluxes by using an optical path-dividing element, allowing one light flux of the divided light fluxes to pass through a pinholeto covert the one light flux into a reference light beam which is a substantially ideal spherical wave, and detecting interference fringes generated by causing interference between the reference light beam and a measuring light beam which is the other light flux of the divided light fluxes. The wavefront aberration of the test sample can be measured by observing the interference fringes without being affected by the disturbance which would be otherwise caused by any system vibration or the like.

Method and apparatus for point diffraction interferometry

A scanning probe microscope, capable of achieving a resolving power of atomic level, is provided with a probe microscope unit 5, 6, 17 for measuring a fine constitution of sample surface with a probe 5, and with an optical microscope unit 8, 10-16 for observing an optical image of sample, in which the probe microscope unit is encased in a box 9 shielded against external noises and electromagnetic waves. The box has a shape of a cone such as triangular cone, which is placed on a triangular surface plate.

Scanning probe microscope

Growing community of inventors

Sagamihara, Japan

Yasushi Fukutomi