Nikon Corporation

Yasuo Araki

Masato Takahashi

Masahiko Yasuda

Yutaka Endo

Shinji Mizutani

Hideaki Sakamoto

Noriaki Tokuda

Ken Hattori

Masaya Iwasaki

Hiroaki Narushima

Naohiko Iwata

The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Exposure apparatus and device manufacturing method

An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method

Growing community of inventors

Yokohama, Japan

Yasuo Araki