Fujitsu Corporation

Fujitsu Semiconductor Limited

Yasuhide Machida

Hiromi Hoshino

Kozo Ogino

Yasuo Manabe

In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of: classifying a pattern in terms of a target linewidth; setting a standard characteristic showing the relationship between a standard dose and a resultant linewidth of a resist pattern for a group of patterns having the target linewidth; and preparing exposure data by correcting a shape and dose so that a characteristic showing the relationship between dose of each pattern having the target linewidth and a resultant linewidth of a resist pattern follows the standard characteristic.

Exposure data preparation method and exposure method

The present invention relates to a charged particle beam exposure method, wherein exposure data having exposure pattern data for each of a plurality of sub-fields located in a main field are acquired from pattern data for each of the sub-fields and a sample is exposed in accordance with the exposure data. The method comprises the steps of: forming a plurality of areas having different shapes, in accordance with patterns in the sub-fields, and acquiring pattern densities in the areas; correcting the pattern densities in accordance with pattern densities for areas surrounding the areas and with distances between the areas; generating auxiliary exposure patterns in the areas when the pattern densities for the areas are lower than a predetermined reference exposure density; and exposing the sample in accordance with the exposure data obtained by adding the data for the auxiliary exposure patterns to the pattern data. According to the present invention, a variable area can be formed, the number of areas can be reduced, and data processing can be performed more efficiently.

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Kawasaki, Japan

Yasuhide Machida