Applied Materials Israel Limited

Yakov Weinberg

Ishai Schwarzband

Roman Kris

Ran Goldman

Ofer Adan

Shimon Levi

Dhananjay Singh Rathore

Itay Zauer

Olga Novak

Yan Ivanchenko

Efrat Noifeld

Ori Shoval

Dan Lange

Arbel Englander

Hagai Kirshner

A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.

Technique for measuring overlay between layers of a multilayer structure

A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.

CD-SEM technique for wafers fabrication control

A technique for visualizing elements in images by applying a color coding procedure to data which comprises an initial image and segmentation results based on N labels. The segmentation results comprise information on segmentation uncertainty. The color coding procedure constructs a resulting colored image based on the initial image and N pre-selected base colors, and in such a manner that colors in the resulting colored image are modified by using intensity of the initial image and the information on segmentation uncertainty.

Technique for visualizing elements in images by color coding

A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.

Three-dimensional mapping using scanning electron microscope images

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Modiin, Israel

Yakov Weinberg