Shanghai Huali Microelectronics Corporation

Xinxing Tu

Yuhong Lang

The present application discloses a method for purge clean of a low pressure furnace, comprising: step, providing a process chamber of the low pressure furnace in a standby state, wherein an inner wall thin film formed by a furnace deposition process is accumulated on the surface of an inner wall of the process chamber; step, performing temperature ramp-up or temperature ramp-down treatment on the process chamber to generate first thermal stress in the inner wall thin film, wherein thin film particles with poor adhesion in the inner wall thin film peels off; step, introducing a cleaning gas in a pulse manner to perform cycle purge clean on the process chamber, so as to remove the peeling thin film particles from the process chamber; and step, switching a state of the process chamber to the standby state after the cycle purge clean ends.

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Shanghai, China

Xinxing Tu