1. Chinese Academy of Sciences (12 from 3,086 patents)

2. Shanghai Micro Electronics Equipment Co., Ltd. (1 from 23 patents)

1. 11788829 - Simultaneous phase-shift point diffraction interferometer and method for detecting wave aberration

2. 11668625 - Apparatus and method for detecting wavefront aberration of objective lens

3. 11604418 - Multi-channel device and method for measuring distortion and magnification of objective lens

4. 11561082 - Method for compensation during the process of wavefront reconstruction in grating-based lateral shearing interferometry

5. 11340118 - Method for high-accuracy wavefront measurement base on grating shearing interferometry

6. 11215512 - Light intensity fluctuation-insensitive projection objective wave aberration detection device and detection method thereof

7. 11029611 - Device and method for detecting projection objective wave-front aberration

8. 11009336 - Method for wavefront measurement of optical imaging system based on grating shearing interferometry

9. 10969274 - Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer

10. 9863841 - Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof

11. 9766154 - Multi field point aberration parallel metrology device and method for lithographic projection lens

12. 9658114 - Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberration

13. 8035801 - Method for in-situ aberration measurement of optical imaging system in lithographic tools