Scp Global Technologies, Inc.

Marian Corporation

William Warren Becia

Thomas Wayne Ives

Victor B Mimken

Eric T Hansen

Randy Mark Hall

Sven Evers

Tom Krawzak

Thomas Krawzak

Douglas R Farnlund

Edward R Fix

The invention relates to a wafer transfer system that achieves high efficiency, as measured by throughput rate. This is accomplished in one instance by the combination of reliable transfer of single wafers between ports while being simultaneously rotated to accomplish notch alignment. Another instance allows for simultaneous tilting of a multitude of wafers, such as changing the entire load of a transfer cassette between horizontal and vertical orientations, rather than operating on individual wafers serially. Furthermore, the design of this system renders it usable in both left-handed and right-handed workflow arrangements, not requiring construction of mirror-image systems and thereby achieving an economy of scale in production and inventory of the wafer transfer system itself.

Method, device and system for semiconductor wafer transfer

A multiple stage wet processing platform includes a sealable enclosure, at least two processing modules positioned within the enclosure, at least one of them including a housing having an opening and a door moveable into position covering the opening, at least two processing vessels within the housing, and an intra-module robot within the housing and including a wafer support member, the intra-module robot moveable to a first position in which the support is disposed in a first one of the processing vessels and a second position in which the support is disposed in a second one of the processing vessels. An inter-module robot is positioned within the enclosure and is moveable between a first position adjacent to a first one of the modules and a second position adjacent to a second one of the modules.

Multiple stage wet processing platform and method of use

An apparatus and method for performing multiple wet processing steps on objects placed within a sealed chamber. The apparatus include a sealable chamber, at least one processing tank within the chamber, and preferably also includes an intrachamber robot configured to move objects to be treated within the chamber. Preferred embodiments utilize at least two processing tanks within the chamber. During use of these exemplary embodiments, objects to be treated are placed within the sealed chamber and the chamber is sealed to create a sealed interior environment. The objects are immersed in a first treatment fluid which is in a first one of the tanks, and then carried by the intrachamber robot from the first to the second tank where there are immersed in a second treatment fluid in the second tank. The objects may be moved back and forth between the tanks as needed in order to complete the process being performed. After processing is complete, the chamber is unsealed and the objects are removed from the chamber. In a preferred method, processing fluids are drained from the tanks at some point prior to the unsealing of the chamber in order to substantially prevent passage of fumes to the outside environment or contaminants from the exterior environment.

Multiple stage wet processing chamber

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Boise, ID, United States of America

William Warren Becia