Hughes Danbury Optical Systems, Inc.

The B. F. Goodrich Company

Litton Systems, Inc.

William G McKinley

Gerard M Perron

Berge Tatian

John R Burgess

Bernhard P Piwczyk

A photolithography system includes a light source and illumination optics which receive light from the light source and project illumination light onto a mask. Light transmitted through the mask is received by projection optics which generate an enlarged image of the mask. The enlarged image is projected onto the surface of a substrate such as a semiconductor wafer or flat panel display. The system achieves a wafer or panel feature size of less than 10 &mgr;m, preferably 3 &mgr;m, while enlarging the image of the mask to produce large wafers and panels in a single exposure. A deformable substrate chuck is selectively deformable to ensure a flat substrate surface. An alignment subsystem ensures precise registration between exposure layers.

Lithography system and method with mask image enlargement

A deformable substrate chuck includes a deformable mounting plate supported by a plurality of individually controllable variable-length actuators. Each actuator is controllable to vary the height of the portion of the deformable mounting plate which it supports. A chamber within the mounting plate accessible through a vacuum port can be evacuated to hold a substrate such as a semiconductor wafer or a flat panel display to a porous top surface of the mounting plate. An optical sensing system senses the shape of the substrate and generates control signals used to control the lengths of the variable-length actuators to control the shape of the substrate.

Mounting member method and apparatus with variable length supports

An optical beam regenerator includes a plurality of optical fibers into which an input beam is directed. The optical fibers are positioned to rearrange portions of the input beam to generate an output beam having a uniform or other prescribed distribution of irradiance. To further smooth the irradiance distribution of the output beam, the beam can be directed through a Kohler illumination system.

Optical beam regeneration by optical fiber remapping

An optical system and method for rotating an image of an object is disclosed. The device consists of a plurality of optical surfaces for either reflecting or refracting the light along an optical path through the device. The optical surfaces divide the optical path into optical path segments which intersect at predetermined angles. These angles are selected to minimize polarization of the output light. The optical path segments lie in more than one plane.

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Littleton, MA, United States of America

William G McKinley