Koninklijke Philips Corporation N.V.

Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Philips Corporate Intellectual Property Gmbh

Other

Carl-zeiss-stiftung

Leybold Aktiengesellschaft

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Willi Neff

Klaus Bergmann

Jeroen Jonkers

Rainer Lebert

Klaus Pochner

Oliver Rosier

Joseph Rr Pankert

Günther Hans Derra

Michael Scherer

Gerhard Lepperhoff

Eric Gerardus Theodoor Bosch

Guenther Hans Derra

Peter Zink

Michael Loeken

Dominik Marcel Vaudrevange

Rolf Theo Anton Apetz

Ulrich Patz

Joseph Robert Rene Pankert

Franz Richter

Raymond Holz

Georg L&uuml;tkemeyer

Jürgen Klein

Guido Schriever

Jens Kamp

Franz-Josef Trompeter

Michael Löken

Stefan Seiwart

Stefan Seiwert

A method of generating in particular EUV radiation () and/or soft X-ray radiation () emitted by a plasma () is described. The plasma () is formed by an operating gas () in a discharge space () which comprises at least one radiation emission window () and an electrode system with at least one anode () and at least one cathode (). This electrode system transmits electrical energy to the plasma () by means of charge carriers () introduced into the discharge space (). It is suggested for obtaining a reliable ignition of the plasma () at high repetition frequencies that a radiation () generated by at least one radiation source () is introduced into the discharge space () for making available the discharge carriers ().

Method and device for generating EUV radiation and/or soft X-ray radiation

A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.

Extreme UV and soft X ray generator

The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate () is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate ().

Method and device for the generation of a plasma through electric discharge in a discharge space

A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma () is ignited in a gaseous medium between at least two electrodes () in a discharge space (), said plasma emitting said radiation that is to be produced. The gaseous medium is produced from a metal melt (), which is applied to a surface in said discharge space () and at least partially evaporated by an energy beam, in particular by a laser beam ().

Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation

The invention relates to a gas discharge lamp for EUV radiation with an anode () and a hollow cathode (), wherein the hollow cathode () has at least two openings (') and the anode () has a through hole (), which is characterized in that the longitudinal axes (&#x2032;) of the hollow cathode openings () have a common point of intersection S lying on the axis of symmetry () of the anode opening ().

Gas discharge lamp for extreme UV radiation

A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography, wherein a discharge chamber () of a predetermined gas pressure and two electrodes () are used, wherein the electrodes have an opening (), respectively, positioned on the same symmetry axis () and, in the course of a voltage increase () upon reaching a predetermined ignition voltage (U), generate a plasma () located in the area between their openings (), which plasma is a source of the radiation (') to be generated,wherein an ignition of the plasma () is realized by affecting the gas pressure and/or by triggering,and wherein, with the ignition of the plasma (), an energy storage device supplies by means of the electrodes () stored energy into the plasma (), characterized in that the ignition of the plasma () is realized by using a predetermined ignition delay ().

Method and device for producing extreme ultraviolet radiation and soft x-ray radiation

In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Method and device for the generation of far ultraviolet or soft x-ray radiation

The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry &lsqb;( )&rsqb; is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.

Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge

A device for the treatment of a flowing gas, such as an exhaust gas, includes at least one pair of smooth electrodes that are arranged opposite each other so that they form between them a discharge space through which a gas flows. For each pair of electrodes, at least one electrode is coated with a dielectric material on a side facing the discharge space. At least one electrode has one or more thickened areas facing the discharge space. The one or more thickened area has at least one opening through which the gas can flow. A device may be used in the cleaning of exhaust gases from internal combustion engines of motor vehicles as well as the cleaning of waste gases of power plants or waste incinerating plants.

Device and method for treating flowing gases, in particular exhaust gases

A method and a device for generating extreme ultraviolet (EUV) and soft x-ray radiation from a gas discharge. The device has at least two electrodes each having a flush opening by which an axis of symmetry is defined, in which an intermediate space with a wide spatial homogenous gas filling between anode and cathode is provided. The electrodes are formed in such a way, that the gas discharge is formed exclusively in the volume defined by the flush openings. The current pulses with respect to amplitude and period duration are selected in such a way that a dense hot plasma channel is formed on the axis of symmetry, the plasma being the source of EUV and/or soft x-ray radiation. The preferred area of application is the EUV projection lithography in the spectral range around 13 nm.

Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge

Process and device for operating an internal combustion engine with less pollutant emission

A barrier discharge device (4a, 4b, 4c) installed in a vacuum chamber (1) consists essentially of at least two facing electrodes (20, 22); a dielectric (22) situated between the electrodes (20, 22) and in the immediate proximity of one of these electrodes (20); and a power source (26), which is connected electrically to the electrodes (20, 22). The plasma particles and UV radiation generated during the electrical discharge between the electrodes (20, 22) pass through the electrode (22), which is permeable to UV radiation and plasma particles, and thus emerge from the discharge space. On the surfaces (5a, 5b), the UV radiation induces a photochemical cleaning process, and the impinging plasma particles induce a plasma-chemical cleaning process. The cleaning process is essentially independent of pressure and can be used at pressures of up to 10 bars, which means that the cleaning process can be operated in particular during the time in which the vacuum chamber (1) is being pumped out.

Process for cleaning a substrate using a barrier discharge

The invention is an improvement in a device for generating X-radiation with a plasma source. In the device, two concentric cylindrical electrodes (11, 12) are separated by an evacuated discharge space (13) filled with low-pressure gas. When the inner electrode is momentarily raised to an extremely high voltage, the gas is ionized and a plasma shock wave (17, 17') is created and compressed into a plasma focus (21) emitting X-radiation (20). The improvement introduces a first ('discharge') gas into the discharge space for initiation of the plasma, while introducing a second ('emitting') gas into the inner electrode for generating the X-radiation in the plasma focus. Special features of the improved device include a plurality of gas extraction ports, which can be used independently or together, and which can be combined with variations in the introduction and flow of the two gases to control the movement and intermixture of the gases and, thereby, the operation of the device. Also, the device introduces a third gas for improving the transmission of the X-radiation from the generating plasma focus to a work station for X-ray microscopy or for X-ray lithography.

Device for generating X-radiation with a plasma source

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Kelmis, Belgium

Willi Neff