Taiwan Semiconductor Manufacturing Comp. Ltd.

Wen-Yao Chen

Chen-Yu Chang

Yuh-Fong Hwang

Chiech-Yi Kuo

Li-Ren Lin

Yu-Feng Huang

Yuh-Dean Tsay

Tai-Yi Yang

Shih-Chieh Liao

A method for controlling mask fabrication is provided, wherein the method uses statistical process control analysis. A manufacturing model is defined. A process run of a mask is performed as defined by the manufacturing model. A fault detection analysis is performed to reduce a bias in the manufacturing model. A fine-tuning signal is generated in response to a result of the fault detection analysis. The process run operation is adjusted according to the fine-tuning signal.

Method and system for mask fabrication process control

A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.

An interlock system prevents collision of handling equipment and damage to wafers in an automated wafer transport apparatus during manual control by an operator. Sensors are used to sense when wafer transport arms and wafer stage are both in their home positions. A controller is responsive to the sensors for operating the lockout system such that attempted activation of the transport arm by the operator is locked out unless both the stage and the arms are in their home positions. The lockout system preferably comprises normally closed electrical relays.

Interlock system for semiconductor wafer transport apparatus

The present invention discloses an allocation method for establishing a theoretical dispatching model for dynamically allocating the bottleneck resource according to the on-line current data. At first, the on-line current data are obtained from the bottleneck resource and those tools next to the bottleneck resource. Decision parameters such as the remaining processing time, buffer WIP of the tools next to bottleneck resource are sequentially derived by using the current data. Each tool next to the bottleneck resource is then determined to receive additional lots from the bottleneck resource or not. Finally, the bottleneck resource is reallocated to those tools that requires the lots from the bottleneck resource.

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Hsinchu, Taiwan

Wen-Yao Chen