Hermes-epitek Corporation

Wen-Sheng Lin

Chih-Ming Hu

Shih-Chieh Jang

Chun-Yen Lin

Chen Hsu

An electrode structure adapted for high applied voltage is provided, which comprises a conductive plate substrate and a covering layer disposed thereon such that a covering percentage of the covering layer over the conductive plate substrate is more than 50%. Since area of the conductive plate substrate covered by the covering layer is larger than the area exposed, the possibility of arcing is reduced and the breakdown voltage applied to the electrode structure may be increased.

Growing community of inventors

Toufen, Taiwan

Wen-Sheng Lin