Growing community of inventors

Hong Kong, China

Weijing Lu

Average Co-Inventor Count = 3.95

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 4

Weijing LuLei Huang (48 patents)Weijing LuMaria Anna Rzeznik (10 patents)Weijing LuZukhra I Niazimbetova (6 patents)Weijing LuLingli Duan (6 patents)Weijing LuChen Chen (6 patents)Weijing LuZuhra I Niazimbetova (4 patents)Weijing LuWeijing Lu (10 patents)Lei HuangLei Huang (48 patents)Maria Anna RzeznikMaria Anna Rzeznik (47 patents)Zukhra I NiazimbetovaZukhra I Niazimbetova (18 patents)Lingli DuanLingli Duan (14 patents)Chen ChenChen Chen (6 patents)Zuhra I NiazimbetovaZuhra I Niazimbetova (24 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Rohm & Haas Electronic Materials LLC (10 from 696 patents)

2. Dow Global Technolgoies LLC (4 from 4,658 patents)


10 patents:

1. 12398479 - Copper electroplating baths containing reaction products of amines, polyacrylamides and bisepoxoides

2. 11761107 - Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones

3. 10738388 - Copper electroplating baths containing compounds of reaction products of amines and polyacrylamides

4. 10662541 - Copper electroplating baths containing reaction products of aminex, polyacrylamides and bisepoxides

5. 10604858 - Copper electroplating baths containing compounds of reaction products of amines, polyacrylamides and sultones

6. 10590556 - Copper electroplating baths containing compounds of reaction products of amines and quinones

7. 9725816 - Amino sulfonic acid based polymers for copper electroplating

8. 9611560 - Sulfonamide based polymers for copper electroplating

9. 9598786 - Amino sulfonic acid based polymers for copper electroplating

10. 9562300 - Sulfonamide based polymers for copper electroplating

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as of
1/11/2026
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