Tokyo Electron Limited

Wataru Nakagomi

Hiroshi Nakamura

Kazunori Kazama

Shouichi Otake

Tatsuya Mukoyama

Shigeru Kubota

Ryuhei Higashimura

Sho Ichinose

Junya Chizuwa

Akihito Komiyama

A substrate processing apparatus is provided. The substrate processing apparatus for processing substrates includes a plurality of processing modules that perform predetermined processes on the substrates, and an information display that displays information about an error that occurred in the predetermined processes. The information display displays, in the same screen, a substrate on which a predetermined process in which the error occurred, a processing module which was performing the predetermined process in which the error occurred, the timing at which the error occurred, and a main cause of the error.

Substrate processing apparatus and substrate processing method

A processing systemapplies an etching process on a wafer W in a PMor PM. An ECincludes functions of a transfer/process control unit, a communication unit, a log management unit, and a backup unit, and controls the processing system. The transfer/process control unitcontrols wafer transfer and the etching process. The communication unittransmits to or receives data from each MCand the like. The log management unitregisters log information generated at times of the wafer process and transfer, data communication, and the like in log files (in predetermined storage areas of an HDD). The backup unitcollectively saves the log information stored in the log files in backup files (in other storage areas of the HDD), in response to a timing when an unexpected alarm has been generated.

System, method and storage medium for controlling a processing system

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Yamanashi, Japan

Wataru Nakagomi