Kla-tencor Technologies Corporation

Kla Tencor Corporation

Waiman Ng

David Lewis Adler

Douglas K Masnaghetti

Stefano E Concina

Stanley S Sun

Amir Azordegan

Gian Francesco Lorusso

Mark Allen Neil

Ananthanarayanan Mohan

Srini Vedula

A method of improving stability for CD-SEM measurements of photoresist, in particular 193 nm photoresist, and of reducing shrinkage of 193 nm photoresist during CD-SEM measurements. The photoresist is exposed to a dose of electrons or other stabilizing beam prior to or during CD measurement. One embodiment of the invention includes multiplexing of the SEM electron beam.

Methods of stabilizing measurement of ArF resist in CD-SEM

A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM ( ) has a source unit ( through ) for directing an electron beam ( ) substantially towards a portion of the specimen ( ), a detector ( ) for detecting particles ( ) that are emitted from the specimen ( ), and an image generator ( through ) for generating the image of the specimen ( ) from the emitted particles ( ). The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions ( ) to generate a first image during a first image phase ( ). The specimen is then scanned under a second set conditions ( ) during a setup phase ( ). The second set of conditions is selected to control charge on the specimen. The specimen is then scanned under the first set of conditions ( ) to generate a second image during a second image phase ( ). The features of the second image are controlled by the first and second sets of conditions.

Scanning electron beam microscope

A method and apparatus for generating an image of a specimen with a scanning electron microscope (SEM) is disclosed. The SEM has a source unit for directing an electron beam substantially towards a portion of the specimen, a detector for detecting particles that are emitted from the specimen, and an image generator for generating the image of the specimen from the emitted particles. The image features are controlled by conditions under which the image is generated. The specimen is scanned under a first set of conditions to generate a first image during a first image phase. The specimen is then scanned under a second set of conditions during a setup phase. The second set of conditions are selected to control charge on the specimen. The specimen is then scanned under the first set of conditions to generate a second image during a second image phase. The features of the second image are controlled by the first and second sets of conditions.

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Los Gatos, CA, United States of America

Waiman Ng