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Volker Tegeder

Detlef Gerhard

Claus Schneider

Lothar Pfitzner

Eckhard Marx

Reinhold Waller

Michael Lering

Clinton Haris

Johannes Lechner

Heiner Ryssel

J&uuml;rgen Ziegler

The apparatus allows monitoring layer depositions in a process chamber. The apparatus has a light source, a sensor element, and at least one light detector. The sensor element is suitably configured in order to influence the intensity of the light beam measured by the detector by the thickness of the layer growing on the sensor element. The novel monitoring method for measuring the transmitted light intensity utilizes the apparatus. The sensor element has a continuous opening through which the intensity of the light is observed as a function of the opening grown over by the thickness of the growing layer.

Apparatus for monitoring intentional or unavoidable layer depositions and method

A metrology device is described which is couplable to a load port of a semiconductor product handling and/or processing tool. The tool encloses a mini-environmental atmosphere and has a load port table for supporting devices to be coupled to the load port. The metrology device contains a housing preserving an inner atmosphere, a coupling region for connecting the inner atmosphere to the mini-environmental atmosphere and a measuring device for measuring a property of a semiconductor product. The metrology device further has a support which is movable by a transport device and which is dimensioned such that the metrology device is self-supporting in a position appropriate for coupling the coupling region to the load port. The metrology device is thereby couplable to the load port without being supported by the load port table.

Self-supporting adaptable metrology device

A conveyor element ( ) for conveying wafer receptacles between a conveyor ( ) and a loading station ( ) of a manufacturing system in the semiconductor industry has a lifting mechanism ( ) to move the wafer receptacle from a first position of the conveyor ( ) or the loading station ( ) into a second position of the conveyor ( ) or of the loading station ( ) substantially in a vertical direction. Rollers ( ) are provided to move the wafer receptacle from the second position of the conveyor ( ) along a substantially horizontal direction to the second position of the loading station ( ) or from the second position of the loading station ( ) to the second position of the conveyor ( ).

Conveying element and conveyor means for conveying wafer receptacles, and method

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Weissig, Germany

Volker Tegeder