Leica Microsystems Semiconductor Gmbh

Volker Knorz

Edgar Maehringer-Kunz

Michael Veith

A method and an apparatus are described for the optical examination of structured surfaces of objects, especially of wafers and/or masks. The optical apparatus has an observation beam path ( ) whose central axis ( ) is directed vertically against the surface of the object ( ), an illumination beam ( ) whose central ray ( ) falls vertically on the surface of the object, and an illumination beam ( ) whose central ray ( ) falls obliquely onto the surface of the object ( ). In the observation beam path ( ) the image of the surface of the object ( ) is observed and/or detected. In the observation beam path ( ) a filter device ( ) and/or detector device ( ) is disposed. The optical system has an illumination device ( ) for the simultaneous production of a dark field illumination, a device for the coding ( ) of the illumination beams ( ) being associated with the bright field ( ) and/or the dark field illumination beam ( ).

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Huettenberg, Germany

Volker Knorz