Cymer, Inc.

Vladimir A Kulgeyko

William N Partlo

Richard L Sandstrom

Richard M Ness

Xiaojiang Jason Pan

Stuart L Anderson

Igor Vladimirovich Fomenkov

Richard C Ujazdowski

Peter Clarke Newman

Thomas Patrick Duffey

Daniel L Birx

John Martin Algots

Robert A Bergstedt

Scott T Smith

Walter Dale Gillespie

Paul C Melcher

Timothy S Dyer

Vladimir B Fleurov

I Roger Oliver

James K Howey

Curtis L Rettig

German E Rylov

Ronald L Spangler

Robert A Shannon

J Martin Algots

Alex P Ivaschenko

Shahryar Rokni

Jean-Marc Hueber

Brian Strate

Robert B Saethre

David M Johns

Brian D Strate

Martin J Algots

A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

Line narrowing module

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Four KHz gas discharge laser

A gas discharge modular laser with beam train isolation between laser chamber module and front and rear optics which define the laser resonant cavity. Beam train isolation units isolates the beam train from atmospheric air while permitting quick and easy removal of the laser chamber without disturbing the optics of the resonant cavity. In preferred embodiments, metal bellows units are bolted at only side so that the chamber module can be removed and replaced without unbolting the bellows unit.

Beam seal for line narrowed production laser

A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a laser chamber having a gas flow path with a gradually increasing cross section downstream of the discharge electrodes to permit recovery a large percentage of the pressure drop in the discharge region, (2) a squirrel cage type fan for producing gas velocities through the discharge region of more than 76 m/s and capable of continuous trouble-free operation for several months, (3) a heat exchanger system capable of removing in excess of 16 kw of heat energy from the laser gas (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes needed to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz or greater and (5) a laser beam measurement and control system capable of measuring pulse energy wavelength and bandwidth on a pulse-to-pulse laser with feedback pulse-to-pulse control of pulse energy and wavelength.

Extreme repetition rate gas discharge laser

Growing community of inventors

San Diego, CA, United States of America

Vladimir A Kulgeyko