Intel Corporation

Vincent E Dorgan

Uddalak Bhattacharya

Jeffrey Hicks

Sarvesh H Kulkarni

Yu-Lin Chao

Inanc Meric

Abhishek A Sharma

Walid M Hafez

Miriam Ruth Reshotko

Zhanping Chen

Venkata Krishna Rao Vangara

Ilan Tsameret

Embodiments herein may describe techniques for an integrated circuit including a MOSFET having a source area, a channel area, a gate electrode, and a drain area. The channel area may include a first channel region with a dopant of a first concentration next to the source area, and a second channel region with the dopant of a second concentration higher than the first concentration next to the drain area. A source electrode may be in contact with the source area, a gate oxide layer above the channel area, and the gate electrode above the gate oxide layer. A first resistance exists between the source electrode and the gate electrode. A second resistance exists between the source electrode, the gate electrode, and a path through the gate oxide layer to couple the source electrode and the gate electrode after a programming operation is performed. Other embodiments may be described and/or claimed.

Metal-oxide-semiconductor field-effect-transistors (MOSFET) as antifuse elements

Embodiments herein may describe techniques for an integrated circuit including a FinFET transistor to be used as an antifuse element having a path through a fin area to couple a source electrode and a drain electrode after a programming operation is performed. A FinFET transistor may include a source electrode in contact with a source area, a drain electrode in contact with a drain area, a fin area including silicon and between the source area and the drain area, and a gate electrode above the fin area and above the substrate. After a programming operation is performed to apply a programming voltage between the source electrode and the drain electrode to generate a current between the source electrode, the fin area, and the drain electrode, a path may be formed through the fin area to couple the source electrode and the drain electrode. Other embodiments may be described and/or claimed.

FinFET transistors as antifuse elements

Memory cell circuitry is disclosed. The memory cell circuitry includes a first transistor configured to have a threshold voltage of the first transistor modulated by hot carrier injection, a second transistor coupled to the first transistor and configured to have a threshold voltage of the second transistor modulated by hot carrier injection, a word line coupled to a gate of the first transistor and to a gate of the second transistor, a first bit line coupled to the first transistor and a second bit line coupled to the second transistor. In addition, the memory cell circuitry includes a source line coupled to the drain of the first transistor and to the drain of the second transistor, the word line and the source line configured to cause hot carrier injection (HCI) into the first transistor when a first supply voltage is applied to the word line and the source line, and the second bit line is floated and the first bit line is grounded. The word line and the source line are configured to cause hot carrier injection into the second transistor when the first supply voltage is applied to the word line and the source line, and the first bit line is floated and the second bit line is grounded. Methods utilizing this technology for generating a multi-time programmable non-volatile memory and a random number generator for physical unclonable function applications are included in this disclosure.

Hot carrier injection fuse memory

Embodiments herein may describe techniques for an integrated circuit including a metal interconnect above a substrate, an interlayer dielectric (ILD) layer above the metal interconnect with an opening to expose the metal interconnect at a bottom of the opening. A dielectric layer may conformally cover sidewalls and the bottom of the opening and in contact with the metal interconnect. An electrode may be formed within the opening, above the metal interconnect, and separated from the metal interconnect by the dielectric layer. After a programming voltage may be applied between the metal interconnect and the electrode to generate a current between the metal interconnect and the electrode, a conductive path may be formed through the dielectric layer to couple the metal interconnect and the electrode, changing the resistance between the metal interconnect and the electrode. Other embodiments may be described and/or claimed.

Antifuse memory arrays with antifuse elements at the back-end-of-line (BEOL)

Embodiments herein may describe techniques for an integrated circuit including a metal interconnect above a substrate and coupled to a first contact and a second contact. The first contact and the second contact may be above the metal interconnect and in contact with the metal interconnect. A first resistance may exist between the first contact and the second contact through the metal interconnect. After a programming voltage is applied to the second contact while the first contact is coupled to a ground terminal to generate a current between the first contact and the second contact, a non-conducting barrier may be formed as an interface between the second contact and the metal interconnect. A second resistance may exist between the first contact, the metal interconnect, the second contact, and the non-conducting barrier. Other embodiments may be described and/or claimed.

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Hillsboro, OR, United States of America

Vincent E Dorgan