Insystems, Inc.

Optical Specialties, Inc.

Victor A Scheff

Lawrence H Lin

Robert B Howe

An inspection system (2) employs a beam of monochromatic light (12) that travels through a Fourier transform lens (16) before striking a specimen wafer (4) at an angle (.THETA.) with respect to the normal (26) of the specimen wafer (4) to produce diffracted light (28b ) and 28c) that has a broad spatial frequency spectrum which can be selectively filtered to produce a dark field image pattern of the various sized defects in an inspection area (22) of the wafer. The nearly collimated beam of monochromatic light strikes the wafer at an angle (.THETA.) with respect to the normal of the wafer of between zero degrees and a predetermined maximum angle. For the inspection system disclosed, the predetermined maximum angle is the angle formed when the beam of monochromatic light is as far away from the optic axis as possible yet still within the numerical aperture of the Fourier transform lens (16). Moreover, if a specific range of defect sizes is anticipated, the system can be optimized by setting the angle (.THETA.) at which the collimated beam of monochromatic light strikes the wafer to the angle (.THETA.) which allows the system to collect those spatial frequencies which are best representative of the anticipated range of defects sizes.

Inspection system with in-lens, off-axis illuminator

In an imaging system (10) for detecting defects in a specimen (14) having a repetitive pattern (16), a spatial filter (50) receives a spatial frequency spectrum produced by a Fourier transform lens (34) and blocks preselected spatial frequency components thereof. The spatial filter includes an array of substantially parallel opaque stripes (70a-70c) that are positioned on a substantially transparent substrate (72). In one embodiment, the stripes are spaced apart by equal distances (78) and are of increasing widths (76a-76c) that correspond to the orders of diffraction of the Fourier transform pattern (45) produced by the Fourier transform lens. The spatial filter can be used to filter light spots forming a Fourier transform pattern for specimens having repetitive pattern sizes included within a specified range of sizes.

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Alameda, CA, United States of America

Victor A Scheff