Taiwan Semiconductor Manufacturing Comp. Ltd.

Tzu Chan Weng

Yi-Wei Chiu

Ching-Chung Su

Pin Chia Su

Kuo-Hsiu Wei

Chih-Cherng Jeng

Yih Song Chiu

A method of measuring dimensional characteristics includes providing a substrate and forming a reflective layer over the substrate. A dielectric layer is then formed over the reflective layer. The dielectric layer includes a grating pattern and a resistivity test line inset in a transparent region. Radiation is then directed onto the dielectric layer so that some of the radiation is transmitted through the transparent region to the reflective layer. A radiation pattern is then detected from the radiation reflected and scattered by the metal grating pattern. The radiation pattern is analyzed to determine a first dimensional information. Then the resistance of the resistivity test line is measured, and that resistance is analyzed to determine a second dimensional information. The first and second dimensional informations are then compared.

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Kaohsiung, Taiwan

Tzu Chan Weng